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Synthesis of Carbon, Silicon, and Boron-nitride Nanostructures via Microwave Plasma Enhanced Chemical Vapor Deposition

Published online by Cambridge University Press:  15 March 2011

Hongtao Cui
Affiliation:
Department of Physics and Astronomy, UNC-CH, Chapel Hill, NC
Wei Liu
Affiliation:
Department of Materials Science and Engineering, NCSU, Raleigh, NC
Brian R. Stoner
Affiliation:
Department of Physics and Astronomy, UNC-CH, Chapel Hill, NC stoner@physics.unc.edu
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Abstract

Carbon, silicon nitride and boron nitride nanostructures were synthesized using microwave plasma enhanced chemical vapor deposition. Both scanning and transmission electron microscopies and x-ray diffraction were used to observe the morphology and structures while energy dispersive x-ray was used to determine the composition of the nanostructured materials. Bamboo-like multiwalled carbon nanotube structures were observed while silicon nitride showed novel needle-like solid structures. All materials were deposited using a thin film iron catalyst seeded on either silicon with reactive plasma gases containing either a mixture of methane and ammonia or ammonia. A general discussion of the nucleation and growth mechanisms for the various materials will also be included.

Type
Research Article
Copyright
Copyright © Materials Research Society 2001

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References

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Synthesis of Carbon, Silicon, and Boron-nitride Nanostructures via Microwave Plasma Enhanced Chemical Vapor Deposition
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