A Scanning Electron Microscopy method called Dark Voltage Contrast (DVC) was applied for the first time to investigate on a microscale, the narrow depletion region of a Zener diode. Zener diodes were fabricated by the Sprague Semiconductor Corp. using conventional boron diffusion into a n-type wafer with phosphorus.

Zener diodes were chosen because of the presence of a shallow p-n junction and for the ability of Zeners to work in the breakdown regime where the dynamics of the current might influence the field distribution in the p-n junction. The samples were examined in the SEM with a beam current below 50 pA to minimize injection of electrons into the depletion region.

Reverse and forward biased diodes were examined and potential distribution information was obtained, using Dark Voltage Contrast software. Doping information and C-V measurements were used to double check DVC depletion region measurements.

The main results of these studies include measurements of electrical field for three regimes of operation: forward, reverse, and breakdown, with almost ideal field distribution in some Zeners, and fluctuations in others. The field irregularities are related to the defects in the junction area. However the amount of charge build-up appears to depend on the current flow in the dynamic regime for the breakdown. The typical measurements of depletion region width were Wf=.14 μm when forward biased, Wr=0.35 μm at 3-4 volts when reverse biased and Wbr=0.44 gm for 6 v of breakdown. This data helps to reconstruct the diffusion profile.