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Role of the Collecting Resistive Layer on the Static Characteristics of 2D a-Si:H thin Film Position Sensitive Detector

Published online by Cambridge University Press:  10 February 2011

E. Fortunato
Affiliation:
Cenimat, Faculty of Science and Technology of New University of Lisbon and Center of Excellence for Microelectronics and Optoelectronic Processes – CEMOP, Quinta da Torre, 2825 Monte de Caparica, Portugal, ef@uninova.pt
R. Martins
Affiliation:
Cenimat, Faculty of Science and Technology of New University of Lisbon and Center of Excellence for Microelectronics and Optoelectronic Processes – CEMOP, Quinta da Torre, 2825 Monte de Caparica, Portugal, ef@uninova.pt
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Abstract

The aim of this work is to present an analytical model able to interpret the role of the thin collecting resistive layer on the static performances exhibited by 2D amorphous silicon hydrogenated pin thin film position sensitive detectors. In addition, experimental results concerning the device linearity and spatial resolution are presented and checked against the predicted values of the analytical model proposed.

Type
Research Article
Copyright
Copyright © Materials Research Society 1998

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References

REFERENCES

1 Narayanan, C., Buckman, A. Bruce, Bussch-Vishniac, I. and Wang, Wanjun, IEEE Transactions on Electron Devices 40, p. 16881694 (1993).Google Scholar
2 Kawasaki, A. and Goto, M., Sensors and Actuators, A21–A23, p. 534537 (1990).Google Scholar
3 Yamamoto, T., Murakami, K., Takayama, S. and Ono, Y., Sensors & Actuators A30, p. 193196 (1992).Google Scholar
4 Fortunato, E., Lavareda, G., Vieira, M. and Martins, R., Rev. Sci. Instrum. 65, p. 37843787 (1994).Google Scholar
5 Martins, R. and Fortunato, E., in The Technology and Applications of Amorphous Silicon, edited by Street, R., Spring Verlagen, (1998), to be published.Google Scholar
6 Martins, R. and Fortunato, E., Rev. Sci. Instrum. 66 pp. 29272934, 1995.Google Scholar
7 Fortunato, E. and Martins, R. in Hydrogenated Amorphous Silicon", Solid State Phenomena edited by Murch, G.E., Neber-Aeschbacher, H. and Wöhlbier, F.H., Scitec Publications Ltd, Vol. 44–46 (1995), pp. 883931.Google Scholar