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Recoil Implantation of Ito thin Films on Glass Substrates*

Published online by Cambridge University Press:  25 February 2011

B. H. Rabin ,
B. B. Harbison  and
S. R. Shatynski
B. H. Rabin
Affiliation:
Materials Engineering Department, Rensselaer Polytechnic Institute, Troy, NY 12181
B. B. Harbison
Affiliation:
Materials Engineering Department, Rensselaer Polytechnic Institute, Troy, NY 12181
S. R. Shatynski
Affiliation:
Materials Engineering Department, Rensselaer Polytechnic Institute, Troy, NY 12181
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Abstract

Indium-Tin Oxide (ITO) heat mirror films implanted into window glass were obtained by post annealing of argon irradiated coatings of In-5w/o Sn produced by reactive evaporation in oxygen. Characterization of coatings has been carried out using TEM and AES. Optical properties have also been evaluated. The production of acceptable thin films requires low energy deposition rates during ion bombardment. This places a limit on the extent of film-substrate mixing, which is required if increased film lifetimes are to be realized.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 27: Symposium E – Ion Implantation and Ion Beam Processing of Materials , 1983 , 765
Copyright
Copyright © Materials Research Society 1984

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Footnotes

*

The authors are thankful to Professor Stephen R. Shatynski who unfortunately was killed on September 23, 1983. Without his guidance and energies this research would not have been possible. Barry Rabin is a General Electric Company Fellow. The authors also acknowledge the support of Consolidated Edison of New York under Grant No.1–04900.

References

REFERENCES

1. Chopra, K. L., Major, S., and Pandya, D. K., Thin Solid Films 102, 1 (1983).Google Scholar
2. Vossen, J. L., Physics of Thin Films, Vol. 9 (Academic Press, NY 1977).Google Scholar
3. Fan, J. C. C. and Goodenough, J. B., Journal of Applied Physics 48, 3524 (1977).Google Scholar
4. Harbison, B. B., Christian, K. D. J., and Shatynski, S. R., Proceedings of NATO Advanced Study Institute on Surface Engineering (1983).Google Scholar
5. Collins, L. E., Perkins, J. G., and Stroud, P. T., Thin Solid Films 4, 21 (1969).Google Scholar
6. Stroud, P. T., Thin Solid Films 11, 21 (1972).Google Scholar
7. Naguib, H. M. and Kelly, R., Radiation Effects 25, 1 (1975).Google Scholar
8. Christian, K. D. J. and Shatynski, S. R., Applications of Surface Science 15, 178 (1983).Google Scholar
9. Ruedl, E. and Kelly, R., Modern Developments in Powder Metallurgy 2, 145 (1966).Google Scholar
10. Dearnally, G., Freeman, J. H., Nelson, R. S. and Stephan, J., Ion Implantation (North-Holland, Amsterdam 1973).Google Scholar
11. Stroud, P. T., Collins, L. E., Perkins, J. G. and Stephens, K. G., Proceedings of European Conference on Ion Implantation (Peter Peregrins Limited, England 1970) 166.Google Scholar
12. Harbison, B. B., Rabin, B. H. and Shatynski, S. R., Proceedings of NATO Advanced Study Institute on Surface Engineering (1983).Google Scholar
13. Mizuhashi, M., Thin Solid Films 70, 91 (1980).Google Scholar
14. Stephens, K. G. and Wilson, I. H., Thin Solid Films 50, 325 (1978).Google Scholar