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Real-time x-ray scattering study of homoepitaxial growth of SrTiO3 by sputtering

Published online by Cambridge University Press:  11 February 2011

Hsin-Yi Lee ,
C.-H. Hsu ,
Y.-W. Hsieh  and
K. S. Liang
Hsin-Yi Lee
Affiliation:
National Synchrotron Radiation Research Center, Hsinchu 30077, Taiwan
C.-H. Hsu
Affiliation:
National Synchrotron Radiation Research Center, Hsinchu 30077, Taiwan
Y.-W. Hsieh
Affiliation:
National Synchrotron Radiation Research Center, Hsinchu 30077, Taiwan
K. S. Liang
Affiliation:
National Synchrotron Radiation Research Center, Hsinchu 30077, Taiwan
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Abstract

The real-time x-ray scattering measurements under in-situ sputtering conditions were employed to study the growth behavior of sputter-deposited SrTiO3 films on SrTiO3 (001) substrate. A condition for conformal growth between deposited layers and substrate was found by observing the oscillation fringe in the diffuse scattering of measured reflectivity. The azimuthal scan around surface Bragg peak of the film peak shows that the epitaxial relationship between film and substrate can be achieved by sputtering.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 749: Symposium W – Morphological and Compositional Evolution of Thin Films , 2002 , W17.14
Copyright
Copyright © Materials Research Society 2003

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References

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