Hostname: page-component-77c89778f8-m42fx Total loading time: 0 Render date: 2024-07-19T18:59:18.364Z Has data issue: false hasContentIssue false

Raman Spectra of Srm-3Bi4TimO3m+3 Thin Films

Published online by Cambridge University Press:  01 February 2011

Jia Wang
Affiliation:
National Laboratory of Solid State Microstructures, Department of Physics, Nanjing University, Nanjing, 210093, China
Guangxu Cheng
Affiliation:
National Laboratory of Solid State Microstructures, Center of Materials Analysis, Nanjing University, Nanjing, 210093, China
Shantao Zhang
Affiliation:
National Laboratory of Solid State Microstructures, Department of Materials Science and Engineering, Nanjing University, Nanjing, 210093, China
Hongwei Cheng
Affiliation:
National Laboratory of Solid State Microstructures, Department of Materials Science and Engineering, Nanjing University, Nanjing, 210093, China
Yanfeng Chen
Affiliation:
National Laboratory of Solid State Microstructures, Department of Materials Science and Engineering, Nanjing University, Nanjing, 210093, China
Get access

Abstract

A series of bismuth layer-structured ferroelectrics thin films Srm-3Bi4TimO3m+3(m=3, 4, 5, and 6) were deposited by pulsed laser deposition (PLD) on (001) LaAlO3 single crystal substrate. XRD and Raman studies have been performed. The more sensitive Raman spectra lead to a different understanding on the layer structure of Sr3Bi4Ti6O21 from XRD. This can be attributed to the lager c-axis constant of Sr3Bi4Ti6O21 due to more layers. More layers lead to increasing disorder in the local scale of the average grain.

Type
Research Article
Copyright
Copyright © Materials Research Society 2004

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Paz de Araujo, C. A., Cuchlaro, J. D., McMillan, L. D., Scott, M. C., and Scott, J. F. Nature (London) 374, 627 (1995).Google Scholar
2. Kojima, S., Imaizumi, R., Hamazaki, S. and Takashige, M., Jpn. J. Appl. Phys., 33, 5559 (1994).Google Scholar
3. Wang, J., Cheng, G. X., Zhang, S. T., Cheng, H. W., and Chen, Y. F. Physica B (in press).Google Scholar
4. Wang, J., Cheng, G. X., Zhang, S. T., Cheng, H. W., Zhu, Y. P. and Chen, Y. F. submitted to J. Appl. Phys.Google Scholar
5. Zhang, S. T., Yang, B., Webb, J. F., Chen, Y. F., Liu, Z. G., Wang, D. S., Wang, Y. and Ming, N. B., J. Appl. Phys. 92, 4954 (2002).Google Scholar
6. Osada, M., Kakihana, M., Mitsuya, M., Watanabe, T. and Funakubo, H. Jpn. J. Appl. 40, 891(2001).Google Scholar
7. Kojima, S., Imaizumi, R., Hamazaki, S. and Takashige, M., Jpn. J. Appl. Phys., 33, 5559 (1994).Google Scholar
8. Zhang, S. T., Chen, Y. F., Sun, H. P., Pan, X. Q., Tan, W. S., Liu, Z. G. and Ming, N. B., J. Appl. Phys. 94, 544 (2003).Google Scholar