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P-Type Conductivity with a High Hole Mobility in Cubic GaN/GaAs Epilayers

Published online by Cambridge University Press:  10 February 2011

D. J. As
Affiliation:
Universität Paderborn, FB-6 Physik, Warburger Straβe 100, D–33095 Paderborn, Germany, d.as@uni-paderborn.de
A. Rüther
Affiliation:
Universität Paderborn, FB-6 Physik, Warburger Straβe 100, D–33095 Paderborn, Germany, d.as@uni-paderborn.de
M. Lübbers
Affiliation:
Universität Paderborn, FB-6 Physik, Warburger Straβe 100, D–33095 Paderborn, Germany, d.as@uni-paderborn.de
J. Mimkes
Affiliation:
Universität Paderborn, FB-6 Physik, Warburger Straβe 100, D–33095 Paderborn, Germany, d.as@uni-paderborn.de
K. Lischka
Affiliation:
Universität Paderborn, FB-6 Physik, Warburger Straβe 100, D–33095 Paderborn, Germany, d.as@uni-paderborn.de
D. Schikora
Affiliation:
Universität Paderborn, FB-6 Physik, Warburger Straβe 100, D–33095 Paderborn, Germany, d.as@uni-paderborn.de
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Abstract

Temperature dependent Hall-Effect-measurements on unintentionally doped cubic GaN epilayers grown by molecular beam epitaxy (MBE) are reported. The cubic GaN layers have been deposited on semiinsulating (001) GaAs-substrates under N-stabilized growth conditions which were controlled by in-situ reflection high energy electron diffraction (RHEED) measurements. GaN-layers, which were fabricated under N-stabilized conditions have a (2×2) surface reconstruction during growth and show p-type conductivity. At room temperature the measured hole concentrations and mobilities are p = 9.7* 1012 cm-3, μp ≅ 350 cm2/Vs, respectively. Temperature dependent measurements of the carrier concentration yield an acceptor activation energy of EA = 0.445 eV. The nature of these defects will be discussed in view of intrinsic defects proposed by theoretical calculations already published in literature. The temperature dependence of the mobility is dominated by polar optical phonon scattering in the investigated temperature range.

Type
Research Article
Copyright
Copyright © Materials Research Society 1997

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References

REFERENCES

1. Nakamura, S., Senoh, M., Nagahama, S., Iisa, N., Yamaha, T., and Matsushita, T., Kiyoku, H., Sugimoto, Y., Jpn. J. Appl. Phys. 35, L74 (1996)Google Scholar
2. Strite, S. and Morkoc, H., J. Vac. Sci. Technol. B 10, 1237 (1992)Google Scholar
3. Davis, R.F., Proc. IEEE 79, 701 (1991)Google Scholar
4. Rubin, M., Newman, N., Chan, J.S., Fu, T.C., and Ross, J.T., Appl. Phys. Lett. 64, 64 (1994)Google Scholar
5. Lin, M.E., Xue, G., Zhou, G.L., Greene, J.E., and Morkoc, H., Appl. Phys. Lett 63, 932 (1993 Google Scholar
6. As, D.J., Schikora, D., Greiner, A., Lübbers, M., Minkes, J., and Lischka, K., Phys. Rev. B 54, R11118 (1996)Google Scholar
7. Hooper, S.E., Foxon, C.T., Cheng, T.S., Jenkins, L.C., Lacklison, D.E., Orton, J.W., Bestwick, T., Kean, A., Dawson, M., Duggan, G., J. Crystal Growth 155, 157 (1995)Google Scholar
8. Schikora, D., Hankeln, M., As, D.J., Lischka, K., Litz, T., Waag, A., Buhrow, T., and Henneberger, F., Phys. Rev. B 54, R8381 (1996)Google Scholar
9. Powell, R.C., Lee, N.E., Kim, Y.W., and Greene, J.E., J. Appl. Phys. 73, 189 (1993)Google Scholar
10. Yang, H., Brandt, O., and Ploog, K.H., Phys. Stat. Sol. (b) 194, 1 (1996)Google Scholar
11. Siegle, H., Eckey, L., Hoffmann, A., Thomsen, C., Meyer, B.K., Schikora, D., Hankeln, M., and Lischka, K., Solid State Communications 96, 943 (1995)Google Scholar
12. As, D.J., Schmilgus, F., Wang, C., Schöttker, B., Schikora, D., and Lischka, K., submitted to Appl. Phys. Lett.Google Scholar
13. Look, D.C., Electrical Characterization of GaAs Materials and Devices. Wiley & Sons, Chichester, 1989, p.83 Google Scholar
14. Brandt, O., Yang, H., Jenichen, B., Suzuki, Y., Däweritz, L., and Ploog, K.H., Phys. Rev. B 52, R2253 (1995)Google Scholar
15. Boguslawski, P., Briggs, E.L., and Bernholc, J., Phys. Rev. B 51, 17255 (1995)Google Scholar
16. Neugebauer, J. and Van de Walle, C., Phys. Rev. B 50, 8067 (1994)Google Scholar
17. Jenkins, D.W. and Dow, J.D., Phys. Rev. B 39, 3317 (1989)Google Scholar