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Preparation of Fe/SiO2 films by sputtering and their magnetic properties.

Published online by Cambridge University Press:  15 February 2011

Tomoko Akai
Affiliation:
Osaka National Research Institute, Ikeda, Osaka Japan., akai@onri.go.jp
Mitsuharu Tabuchi
Affiliation:
Osaka National Research Institute, Ikeda, Osaka Japan., akai@onri.go.jp
Ryoji Funahashi
Affiliation:
Osaka National Research Institute, Ikeda, Osaka Japan., akai@onri.go.jp
Hiroshi Yamanaka
Affiliation:
Osaka National Research Institute, Ikeda, Osaka Japan., akai@onri.go.jp
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Abstract

SiO2 thin films containing fine Fe particles were prepared by a co-sputtering method. α-Fe particles were then formed by heat-treating the film at 650°C to 700°C. The average size of the particles was controlled by changing heat-treatment time and temperature. The magnetic properties of these samples were investigated and discussed in terms of the size of the particles. It was found that the coercivity of the sample containing α-Fe particles (average particle size = 24nm) is as large as 36 Oe which is much higher than that of the bulk Fe.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

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References

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