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New Photoresists with Photoacid Generator in the Backbone
Published online by Cambridge University Press: 15 March 2011
Abstract
A photoacid generating (PAG) sulfonium monomer was designed and synthesized. CA resists were prepared based on this PAG monomer. Incorporation of the PAG in the resist backbone offered a few advantages such as high sensitivity and absence of phase separation. These resists proved to be especially useful for low-voltage EB lithography.
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- Copyright © Materials Research Society 2002
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