Skip to main content Accessibility help
×
Home
Hostname: page-component-59df476f6b-wrlt9 Total loading time: 0.212 Render date: 2021-05-17T22:47:11.804Z Has data issue: true Feature Flags: { "shouldUseShareProductTool": true, "shouldUseHypothesis": true, "isUnsiloEnabled": true, "metricsAbstractViews": false, "figures": true, "newCiteModal": false, "newCitedByModal": true, "newEcommerce": true }

Microcrystal Si Films Prepared by Remote Plasma CVD

Published online by Cambridge University Press:  21 February 2011

Sung Chul Kim
Affiliation:
Dept. of Physics and Dept. of Electronics, Kyung Hee University, Dongdaemoon-ku, Seoul 130-701, Korea
Jung Tae Hwang
Affiliation:
Dept. of Physics and Dept. of Electronics, Kyung Hee University, Dongdaemoon-ku, Seoul 130-701, Korea
Seung Kyu Lee
Affiliation:
Dept. of Physics and Dept. of Electronics, Kyung Hee University, Dongdaemoon-ku, Seoul 130-701, Korea
Chang Young Jung
Affiliation:
Dept. of Physics and Dept. of Electronics, Kyung Hee University, Dongdaemoon-ku, Seoul 130-701, Korea
Sung Moo Soe
Affiliation:
Dept. of Physics and Dept. of Electronics, Kyung Hee University, Dongdaemoon-ku, Seoul 130-701, Korea
Sung Ok Koh
Affiliation:
Dept. of Physics and Dept. of Electronics, Kyung Hee University, Dongdaemoon-ku, Seoul 130-701, Korea
Kwan Soo Chung
Affiliation:
Dept. of Physics and Dept. of Electronics, Kyung Hee University, Dongdaemoon-ku, Seoul 130-701, Korea
Jin Jang
Affiliation:
Dept. of Physics and Dept. of Electronics, Kyung Hee University, Dongdaemoon-ku, Seoul 130-701, Korea
Get access

Abstract

The effects of deposition temperature, rf power and hydrogen dilution ratio on the growth, structure and transport of p-type microcrystal(μc-) Si films deposited by remote plasma CVD have been investigated. While low substrate temperature and low rf power yield small grain sizes, high temperature and high rf power tend to supress the growth of grains. The etching of Si by hydrogen radicals plays an important role to grow μc-Si, but excess etching supresses the growth of crystallites. We obtained 400 A of grain size and 3.5 S/cm of room temperature conductivity for p-type μ-Si.

Type
Research Article
Copyright
Copyright © Materials Research Society 1990

Access options

Get access to the full version of this content by using one of the access options below.

References

1. Tsai, C.C., in Amorphous Silicon and Related Materials edited by Fritzsche, H. (World Scientific Publishing, Singapore, 1989), vol.1, p. 123.CrossRefGoogle Scholar
2. Oort, R.C. van, Geerts, M.J., Heuvel, J.C. van den, Metselaar, J.W., Electronics Letters 23, 967(1987).CrossRefGoogle Scholar
3. Shibata, N., Miyauchi, A., Tanabe, A., J- Hanna, Oda, S. and Shimizu, I., Jpn J. Appl. Phys. 25, 1783(1986).CrossRefGoogle Scholar
4. Parsons, G.N., Tsu, D.V. and Lucovsky, G., J. Non-Cryst. Solids 97&98, 1375(1987).CrossRefGoogle Scholar
5. Cullity, B.D., “Elements of x-ray diffraction”, Addison-Wesley. Reading, MA. 1978, p. 284.Google Scholar

Send article to Kindle

To send this article to your Kindle, first ensure no-reply@cambridge.org is added to your Approved Personal Document E-mail List under your Personal Document Settings on the Manage Your Content and Devices page of your Amazon account. Then enter the ‘name’ part of your Kindle email address below. Find out more about sending to your Kindle. Find out more about sending to your Kindle.

Note you can select to send to either the @free.kindle.com or @kindle.com variations. ‘@free.kindle.com’ emails are free but can only be sent to your device when it is connected to wi-fi. ‘@kindle.com’ emails can be delivered even when you are not connected to wi-fi, but note that service fees apply.

Find out more about the Kindle Personal Document Service.

Microcrystal Si Films Prepared by Remote Plasma CVD
Available formats
×

Send article to Dropbox

To send this article to your Dropbox account, please select one or more formats and confirm that you agree to abide by our usage policies. If this is the first time you use this feature, you will be asked to authorise Cambridge Core to connect with your <service> account. Find out more about sending content to Dropbox.

Microcrystal Si Films Prepared by Remote Plasma CVD
Available formats
×

Send article to Google Drive

To send this article to your Google Drive account, please select one or more formats and confirm that you agree to abide by our usage policies. If this is the first time you use this feature, you will be asked to authorise Cambridge Core to connect with your <service> account. Find out more about sending content to Google Drive.

Microcrystal Si Films Prepared by Remote Plasma CVD
Available formats
×
×

Reply to: Submit a response


Your details


Conflicting interests

Do you have any conflicting interests? *