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Laser Induced Wet-Chemical Etching of Mn-Zn Ferrite in H3PO4

Published online by Cambridge University Press:  25 February 2011

Yong Feng Lu
Affiliation:
Faculty of Engineering Science and Research Center for Extreme Materials, Osaka University, Toyonaka, Osaka 560, Japan
Mikio Takai
Affiliation:
Faculty of Engineering Science and Research Center for Extreme Materials, Osaka University, Toyonaka, Osaka 560, Japan
Syohei Nagatomo
Affiliation:
D.S. Scanner Co., Ltd., Izumimachi, Higashiku, Osaka 540, Japan
Susumu Namba
Affiliation:
Faculty of Engineering Science and Research Center for Extreme Materials, Osaka University, Toyonaka, Osaka 560, Japan
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Abstract

Maskless etching of single crystalline Mn-Zn ferrite in an H3PO4 aqueous solution by Ar+ laser irradiation has been investigated to obtain high etching rates and aspect-ratios of etched grooves. The etching processes have been found to be photochemical in a low laser power region and thermochemical in a high laser power region. High etching rates of up to 340 pm/s and an aspect-ratio of 50 for slab structures have been achieved. Periodic ripple structures have been observed under specific etching conditions due to the local surface melting.

Type
Research Article
Copyright
Copyright © Materials Research Society 1989

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References

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