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KrF Laser-Induced Nanometer Si Crystallites Formation and Tem Observation

Published online by Cambridge University Press:  15 February 2011

Xinfan Huang
Affiliation:
Dept. of Physics and National Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210008, CHINA
Zhifeng Li
Affiliation:
Dept. of Physics and National Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210008, CHINA National Laboratory for Superlattices and Microstructures, Beijing 100083, CHINA
Wei Wu
Affiliation:
Dept. of Physics and National Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210008, CHINA
Xiaoyuan Chen
Affiliation:
Dept. of Physics and National Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210008, CHINA
Wei Li
Affiliation:
Dept. of Physics and National Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210008, CHINA
Ling Hong
Affiliation:
Dept. of Physics and National Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210008, CHINA
Qi Li
Affiliation:
Dept. of Physics and National Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210008, CHINA
Kunji Chen
Affiliation:
Dept. of Physics and National Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210008, CHINA National Laboratory for Superlattices and Microstructures, Beijing 100083, CHINA
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Abstract

We report the preparation of the nanometer Si crystallites constrained between a-SiNx:H barrier layers by means of KrF excimer laser induced crystallization. X-ray diffraction (XRD) and Raman scattering spectra demonstrate that ultra thin a-Si:H well layers have been crystallized. The average grain size of Si crystallites is on the order of magnitude of a nanometer. Small-angle XRD spectrum indicates multilayer structures have not undergone laser damage. The results of TEM are presented to show smooth and abrupt interfaces of layered structures and nanometer Si crystallites arrayed one-by-one in the Si layer. The thermodynamics of KrF laser-induced crystallization of ultra-thin Si layer has been discussed.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

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References

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