Hostname: page-component-77c89778f8-n9wrp Total loading time: 0 Render date: 2024-07-16T10:11:13.101Z Has data issue: false hasContentIssue false
  • English
  • Français

The Hardness and Wear of Electrochemically Grown Tantalum Oxide

Published online by Cambridge University Press:  10 February 2011

A. W. Mulivor ,
A. B. Mann ,
P. C. Searson  and
T. P. Weihs
A. W. Mulivor
Affiliation:
Materials Science and Engineering Dept., The Johns Hopkins University, 3400 N. Charles St., Baltimore, MD 21218
A. B. Mann
Affiliation:
Materials Science and Engineering Dept., The Johns Hopkins University, 3400 N. Charles St., Baltimore, MD 21218
P. C. Searson
Affiliation:
Materials Science and Engineering Dept., The Johns Hopkins University, 3400 N. Charles St., Baltimore, MD 21218
T. P. Weihs
Affiliation:
Materials Science and Engineering Dept., The Johns Hopkins University, 3400 N. Charles St., Baltimore, MD 21218
Get access

Abstract

For several metallic systems, including tantalum, barrier (non-porous) oxide layers up to 200 nm thick can be grown quickly and efficiently using electrochemical techniques. The thickness of the oxide layer has been found to be linearly proportional to the voltage applied during the electrochemical growth process. These oxides can cause a substantial increase in both the hardness and wear-resistance of the surface. Ex-situ Micro and Nano indentation testing of the Ta/ Ta2O5 system has clearly shown that the indentation hardness increases with oxide thickness, even for indentation depths much greater than the oxide thickness. AFM imaging of indentations and analysis of nanoindentation curves suggests this increased hardness is due to the oxide impeding the pile-up of material at the edges of the indentation, which changes the geometry of the contact. Tribometer testing of various oxide thicknesses has shown that the oxide plays a similar role in preventing wear, specifically by preventing the transfer of material between the two contacting bodies and spreading the load over a greater area. Thus, the electrochemical growth of Ta2O5 provides a convenient method for providing protective hard coatings.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 505 , 1997 , 211
Copyright
Copyright © Materials Research Society 1998

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

[1]Hill, R.Mathematical Theory of Plasticity, Oxford University Press, Oxford, 1950.Google Scholar
[2]Whitehead, A.J., Page, T.F., Mechanical Properties and Deformation Behavior in Materials Having Ultra-Fine Microstructures. edited by Nastazi, M.A., Parkin, D.M., Gleitner, H. (Kluwer Academic Pub., Dordrecht Netherlands, 1993) pp. 481.Google Scholar
[3]Wright, T., Page, T.F.. Surface and Coating Technology 54/55, 557 (1996).Google Scholar
[4]Knight, J.C., Whitehead, A.J., Page, T.F.. J Mater. Sci. 27, 3939 (1996).Google Scholar
[5]Tabor, D., The Hardness of Metals, (Clarendon Press, Oxford, 1951).Google Scholar
[6]Bolshakov, A., Oliver, W.C., Pharr, G.M.. J Mater. Res. 11, 760 (1992).Google Scholar
[7]Tsui, T.Y., Oliver, W.C., Pharr, G.M.. J Mater. Res. 11, 752, (1992).Google Scholar
[8]Macagno, V., Schultze, J.W., J. Electroanal. Chem. 180, 157 (1984).Google Scholar
[9]Bean, C.P., Fisher, J.C., Vermilyea, D.A., Phys. Rev. 101, 551 (1956).Google Scholar
[10]Young, L., Proc. R. Soc. London, Ser. A 258, 496 (1960).Google Scholar
[11]Kalra, K.C., Katyal, P., Singh, K.C., Thin Solid Films 177, 35 (1989).Google Scholar
[12]Oliver, W.C., Pharr, G.M., J. Mater. Res. 7, 1564 (1992).Google Scholar
[13]Tabor, D. in Microindentation Techniques in Materials Science and Engineering edited by Blau, P.J. and Lawn, B.R. (ASTM, Philadelphia, 1986) pp. 129–159.Google Scholar