Skip to main content Accessibility help
×
Home
Hostname: page-component-78bd46657c-2z7pd Total loading time: 0.133 Render date: 2021-05-08T14:57:54.867Z Has data issue: true Feature Flags: { "shouldUseShareProductTool": true, "shouldUseHypothesis": true, "isUnsiloEnabled": true, "metricsAbstractViews": false, "figures": false, "newCiteModal": false, "newCitedByModal": true }

Formation of High-Resistivity Silver-Silicon Dioxide Composite Thin Films Using Sputter Deposition.

Published online by Cambridge University Press:  01 February 2011

Ann Marie Shover
Affiliation:
Department of Physics, University of New Hampshire Durham, New Hampshire 03824, USA
James M.E. Harper
Affiliation:
Department of Physics, University of New Hampshire Durham, New Hampshire 03824, USA
Nicholas S. Dellas
Affiliation:
Department of Physics, University of New Hampshire Durham, New Hampshire 03824, USA
Warren J. MoberlyChan
Affiliation:
Center for Imaging and Mesoscale Structures, Harvard University Cambridge, MA 02138, USA
Get access

Abstract

Composite Ag-SiO2 thin films were deposited to examine the stability of materials with high resistivity above 5000 μΩ-cm. We found that the resistivity increases exponentially with SiO2 volume fractions larger than 0.50 which is consistent with a tunneling conductivity mechanism. In order to obtain a broad composition range, these films were deposited on a stationary substrate placed above Ag and SiO2 sputtering sources. This configuration allowed compositions ranging from 0.8 to 56.3% SiO2 to be deposited on the same sample. Resistance measurements were made using a four-point probe and a profilometer was used to measure thickness. Predicted values of thickness and composition were obtained by calibrating deposition rates from the separate sources, and were verified using Rutherford Backscattering Spectroscopy. Electron microscopy analysis revealed Ag agglomerating on the surface of the film. Because of the high mobility of Ag, the films should be capped to prevent Ag agglomeration. The results of this research demonstrate that high-resistivity thin films can be grown using Ag-SiO2 composites.

Type
Research Article
Copyright
Copyright © Materials Research Society 2005

Access options

Get access to the full version of this content by using one of the access options below.

References

1. Toker, D., Azulay, D., Shimoni, N., Balberg, I., Millo, O., Phys. Rev. B 68, 041403 (2003).CrossRefGoogle Scholar
2. Abeles, B., Pinch, H.L., and Gittleman, J.I., Phys. Rev. Lett. 35, 247, (1975).CrossRefGoogle Scholar
3. Cohen, R.W., Cody, G.D., Coutts, M.D., Abeles, B., Phys. Rev. B 8, 3689, (1973)CrossRefGoogle Scholar
4. Priestley, E.B., Abeles, B., and Cohen, R.W., Phys. Rev. B 12, 2121 (1975)CrossRefGoogle Scholar
5. Stauffer, D. and Aharony, A., in Introduction to Percolation Theory (Taylor and Francis, London, 1992) pp. 1056.Google Scholar

Send article to Kindle

To send this article to your Kindle, first ensure no-reply@cambridge.org is added to your Approved Personal Document E-mail List under your Personal Document Settings on the Manage Your Content and Devices page of your Amazon account. Then enter the ‘name’ part of your Kindle email address below. Find out more about sending to your Kindle. Find out more about sending to your Kindle.

Note you can select to send to either the @free.kindle.com or @kindle.com variations. ‘@free.kindle.com’ emails are free but can only be sent to your device when it is connected to wi-fi. ‘@kindle.com’ emails can be delivered even when you are not connected to wi-fi, but note that service fees apply.

Find out more about the Kindle Personal Document Service.

Formation of High-Resistivity Silver-Silicon Dioxide Composite Thin Films Using Sputter Deposition.
Available formats
×

Send article to Dropbox

To send this article to your Dropbox account, please select one or more formats and confirm that you agree to abide by our usage policies. If this is the first time you use this feature, you will be asked to authorise Cambridge Core to connect with your <service> account. Find out more about sending content to Dropbox.

Formation of High-Resistivity Silver-Silicon Dioxide Composite Thin Films Using Sputter Deposition.
Available formats
×

Send article to Google Drive

To send this article to your Google Drive account, please select one or more formats and confirm that you agree to abide by our usage policies. If this is the first time you use this feature, you will be asked to authorise Cambridge Core to connect with your <service> account. Find out more about sending content to Google Drive.

Formation of High-Resistivity Silver-Silicon Dioxide Composite Thin Films Using Sputter Deposition.
Available formats
×
×

Reply to: Submit a response


Your details


Conflicting interests

Do you have any conflicting interests? *