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Exploration of the Ultimate Patterning Potential Achievable with Focused Ion Beams

Published online by Cambridge University Press:  01 February 2011

Jacques Gierak
Affiliation:
jacques.gierak@lpn.cnrs.fr, CNRS, LPN, Route de Nozay, Marcoussis, 91460, France, 33 (0)1 69 63 60 75
Eric Bourhis
Affiliation:
eric.bourhis@lpn.cnrs.fr, CNRS, LPN, Route de Nozay, Marcoussis, 91460, France
Dominique Mailly
Affiliation:
dominique.mailly@lpn.cnrs.fr, CNRS, LPN, Route de Nozay, Marcoussis, 91460, France
Gilles Patriarche
Affiliation:
gilles.patriarche@lpn.cnrs.fr, CNRS, LPN, Route de Nozay, Marcoussis, 91460, France
Ali Madouri
Affiliation:
ali.madouri@lpn.cnrs.fr, CNRS, LPN, Route de Nozay, Marcoussis, 91460, France
Ralf Jede
Affiliation:
jede@raith.de, Raith GmbH, Hauert 18, Technologiepark, Dortmund, 44227, Germany
Sven Bauerdick
Affiliation:
bauerdick@raith.de, Raith GmbH, Hauert 18, Technologiepark, Dortmund, 44227, Germany
lars bruchhaus
Affiliation:
bruchhaus@raith.de, Raith GmbH, Hauert 18, Technologiepark, Dortmund, 44227, Germany
Peter Hawkes
Affiliation:
hawkes@cemes.fr, CEMES/CNRS, 29 rue Jeanne Marvig, Toulouse, 31055, France
Anne-Laure Biance
Affiliation:
Anne-Laure.Biance@univ-paris-est.fr, Université d'Évry Val d'Essonne, MPI, Bd. François Mitterrand, Évry, 91025, France
Birgitta Schiedt
Affiliation:
birgitta.schiedt@lpn.cnrs.fr, Université d'Évry Val d'Essonne, MPI, Bd. François Mitterrand, Évry, 91025, France
Loïc Auvray
Affiliation:
loic.auvray@univ-evry.fr, Université d'Évry Val d'Essonne, MPI, Bd. François Mitterrand, Évry, 91025, France
Laurent Bardotti
Affiliation:
laurent.bardotti@lpmcn.univ-lyon1.fr, UCB Lyon I et CNRS, LPMCN, 43 Bd du 11 Novembre 1918,, Villeurbanne, 69622, France
Brigitte Prevel
Affiliation:
brigitte.prevel@lpmcn.univ-lyon1.fr, UCB Lyon I et CNRS, LPMCN, 43 Bd du 11 Novembre 1918,, Villeurbanne, 69622, France
Pascal Mélinon
Affiliation:
pascal.melinon@lpmcn.univ-lyon1.fr, UCB Lyon I et CNRS, LPMCN, 43 Bd du 11 Novembre 1918,, Villeurbanne, 69622, France
Alain Perez
Affiliation:
alain.perez@lpmcn.univ-lyon1.fr, UCB Lyon I et CNRS, LPMCN, 43 Bd du 11 Novembre 1918,, Villeurbanne, 69622, France
Jacques Ferré
Affiliation:
ferre@lps.u-psud.fr, UMR CNRS 8502 Univ. Paris Sud, LPS, Bâtiment 510, Orsay, 91405, France
Jean Pierre Jamet
Affiliation:
jamet@lps.u-psud.fr, UMR CNRS 8502 Univ. Paris Sud, LPS, Bâtiment 510, Orsay, 91405, France
Alexandra Mougin
Affiliation:
mougin@lps.u-psud.fr, UMR CNRS 8502 Univ. Paris Sud, LPS, Bâtiment 510, Orsay, 91405, France
Claude Chappert
Affiliation:
claude.chappert@ief.u-psud.fr, Université Paris-Sud, IEF, Bât 220, Orsay, 91405, France
Véronique Mathet
Affiliation:
veronique.mathet@ief.u. -psud.fr, Université Paris-Sud, IEF, Bât 220, Orsay, 91405, France
Lionel Aigouy
Affiliation:
aigouy@optique.espci.fr, CNRS UPR 5, ESPCI, 10 rue Vauquelin, Paris, 75231, France
Isabelle Robert-Philip
Affiliation:
isabelle.robert@lpn.cnrs.fr, CNRS, LPN, Route de Nozay, Marcoussis, 91460, France
Isabelle Sagnes
Affiliation:
Isabelle.Sagnes@lpn.cnrs.fr, CNRS, LPN, Route de Nozay, Marcoussis, 91460, France
Rémy Braive
Affiliation:
Remy.Braive@lpn.cnrs.fr, CNRS, LPN, Route de Nozay, Marcoussis, 91460, France
Alexios Beveratos
Affiliation:
Alexios.Beveratos@lpn.cnrs.fr, CNRS, LPN, Route de Nozay, Marcoussis, 91460, France
Izo Abram
Affiliation:
izo.abram@lpn.cnrs.fr, CNRS, LPN, Route de Nozay, Marcoussis, 91460, France
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Abstract

Decisive advances in the fields of nanosciences and nanotechnologies are intimately related to the development of new instruments and of related writing schemes and methodologies. Therefore we have recently proposed exploitation of the nano-structuring potential of a highly Focused Ion Beam as a tool, to overcome intrinsic limitations of current nano-fabrication techniques and to allow innovative patterning schemes urgently needed in many nanoscience challenges. In this work, we will first detail a very high resolution FIB instrument we have developed specifically to meet these nano-fabrication requirements. Then we will introduce and illustrate some advanced FIB processing schemes. These patterning schemes are (i) Ultra thin membranes as an ideal template for FIB nanoprocessing. (ii) Local defect injection for magnetic thin film direct patterning. (iii) Functionalization of graphite substrates to prepare 2D-organized arrays of clusters. (iv) FIB engineering of the optical properties of microcavities.

Type
Research Article
Copyright
Copyright © Materials Research Society 2008

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Exploration of the Ultimate Patterning Potential Achievable with Focused Ion Beams
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