Standard Focused Ion Beam (FIB) lift-out methods for production of transmission electron microscopy (TEM) thin sections destroy many cubic microns of material in order to produce a single 100-nm thick section. Microtome sectioning, in contrast, allows serial sectioning of adjacent multiple 100-nm sections, without loss of materials between sections, but lacks site specificity. In order to maximize the yield of analyzable material in thin section form from valuableone-of-a kind- micron-sized samples, we have developed serial sectioning techniques that combine FIB lift-out with microtomy. In this paper, we show an example of sectioning and subsequent TEM analysis of simulated cometary residues which resemble impact craters collected during the NASA Stardust Mission. These techniques may be generalized to any one-of-a-kind sample for which preserving analyzable volume is critical, such as forensic analysis of dust particles, failure analysis and electronic device sectioning.

A new template technique has been developed to help patterned growth of carbon nanotubes (CNTs) on Si surface without predeposition of metal catalysts. Focused ion beam (FIB) milling was used to create trenches on Si wafer surface as the template and carbon nanotubes only nucleated and grew inside the trenches during a controlled pyrolysis of iron phthalocyanine at 1000oC. The selective growth in the trenches is due to its special surface morphology, crystalline structure and capillarity effect.

Decisive advances in the fields of nanosciences and nanotechnologies are intimately related to the development of new instruments and of related writing schemes and methodologies. Therefore we have recently proposed exploitation of the nano-structuring potential of a highly Focused Ion Beam as a tool, to overcome intrinsic limitations of current nano-fabrication techniques and to allow innovative patterning schemes urgently needed in many nanoscience challenges. In this work, we will first detail a very high resolution FIB instrument we have developed specifically to meet these nano-fabrication requirements. Then we will introduce and illustrate some advanced FIB processing schemes. These patterning schemes are (i) Ultra thin membranes as an ideal template for FIB nanoprocessing. (ii) Local defect injection for magnetic thin film direct patterning. (iii) Functionalization of graphite substrates to prepare 2D-organized arrays of clusters. (iv) FIB engineering of the optical properties of microcavities.