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Effects of Silica Sources on Nanoporous Organosilicate Films Templated with Tetraalkylammonium Cations

Published online by Cambridge University Press:  31 January 2011

Salvador Eslava
Affiliation:
se296@cam.ac.uksalvadoreslavafernandez@hotmail.com, IMEC, Leuven, Belgium
Jone Urrutia
Affiliation:
jonetxunava@hotmail.com, IMEC, Leuven, Belgium
Abheesh N. Busawon
Affiliation:
abheesh.busawon@imperial.ac.uk, Imperial College London, London, United Kingdom
Mikhail R. Baklanov
Affiliation:
baklanov@imec.be, IMEC, Leuven, Belgium
Francesca Iacopi
Affiliation:
iacopi@imec.be, IMEC, Leuven, Belgium
Karen Maex
Affiliation:
maex@imec.be, IMEC, Leuven, Belgium
Christine E. A. Kirschhock
Affiliation:
christine.kirschhock@biw.kuleuven.be, Katholieke Universiteit Leuven, Centrum voor Oppervlaktechemie en Katalyse, Leuven, Belgium
Johan A. Martens
Affiliation:
johan.martens@biw.kuleuven.be, Katholieke Universiteit Leuven, Centrum voor Oppervlaktechemie en Katalyse, Leuven, Belgium
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Abstract

Nanoporous organosilicate films have been recently prepared using tetraalkylammonium cations in acid and basic media, outperforming other materials. Resulting films using basic medium were called zeolite-inspired low-k dielectrics. Here we study the dependence of the properties of these films on the used silica sources: methyltrimethoxy silane (MTMS) and tetraethyl orthosilicate (TEOS). A set of experiments varying the MTMS:TEOS ratio were prepared in acid medium and characterized. A textural, physico-chemical, mechanical, and electrical characterization of this series of experiments is presented.

Type
Research Article
Copyright
Copyright © Materials Research Society 2009

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