Hostname: page-component-77c89778f8-vsgnj Total loading time: 0 Render date: 2024-07-22T01:02:55.929Z Has data issue: false hasContentIssue false

Effects of Magnetic Field Configuration on Rf Sputtering for CdS/CdTe Solar Cells

Published online by Cambridge University Press:  10 February 2011

A. Compaan
Affiliation:
Univ. of Toledo, Toledo, OH, 43606, adc@physics.utoledo.edu
M. Shao
Affiliation:
Univ. of Toledo, Toledo, OH, 43606, adc@physics.utoledo.edu
A. Fischer
Affiliation:
Univ. of Toledo, Toledo, OH, 43606, adc@physics.utoledo.edu
D. Grecu
Affiliation:
Univ. of Toledo, Toledo, OH, 43606, adc@physics.utoledo.edu
U. Jayamaha
Affiliation:
Univ. of Toledo, Toledo, OH, 43606, adc@physics.utoledo.edu
G. Contreraspuente
Affiliation:
On sabbatical leave from E.S.F.M.-I.P.N., 07738 Mexico DTF.
R. G. Bohn
Affiliation:
Univ. of Toledo, Toledo, OH, 43606, adc@physics.utoledo.edu
Get access

Abstract

We report studies of solar cells prepared by rf planar magnetron sputtering in which the films were deposited using magnetic field structures ranging from approximately balanced to strongly unbalanced in the “type II” configuration. For films grown with the unbalanced configurations, we find much stronger photoluminescence and much better cell performance than for the balanced configuration. The CdTe films show differences in electrical performance depending on magnetic field as well. These effects are interpreted as arising from the enhanced electron and ion bombardment of the film growth interface for the unbalanced magnetrons. Using two unbalanced magnetrons we have fabricated an all-rf-sputtered cell with NREL-verified efficiency of 11.66% at air mass 1.5 illumination.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Ferekides, C., Britt, J., Ma, Y., and Killian, L., Proc. 23rd IEEE Photovoltaic Specialists Conference–1993, (IEEE, Piscataway, N.J., 1993) pp.389393.Google Scholar
2. Compaan, A.D., Shao, M., Tabory, C.N., Feng, Z., Fischer, A., Matulionis, I., and Bohn, R.G., Proc. 24th IEEE Photovoltaic Specialists Conference–1994, (IEEE, Piscataway, N.J., 1995) pp.111114.Google Scholar
3. Window, B. and Savvides, N., J. Vac. Sci. Technol. A, 4, 196202 (1986).Google Scholar
4. Petrov, I., Adibi, F., Greene, J.E., Sproul, W.D., Munz, W.-D., J. Vac. Sci. Technol. A, 10, 32833287 (1992); F. Adibi, I. Petrov, J.E. Greene, U. Wahlstrom, and J.-E. Sundgren, J. Vac. Sci. Technol. A, 11, 136–142 (1993).Google Scholar
5. Rohde, Suzanne L., in Plasma Sources for Thin Film Deposition and Etching, ed. by Francombe, M.H. and Vossen, J.L. (Academic Press, N.Y. 1994), pp. 235288.Google Scholar
6. Feng, Z., Tabory, C.N., Compaan, A.D., Proc. 24th IEEE Photovoltaic Specialists Conference–1994, (IEEE, Piscataway, N.J., 1995) pp.350353.Google Scholar
7. Shao, Meilun, “CdTe and CdS Thin Film Preparation using RF Planar Magnetron Sputtering,” Ph.D. Thesis, University of Toledo, 1995 (unpublished).Google Scholar