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Dust Particle Diagnostics in Rf Plasma Deposition of Silicon and Silicon Oxide Films (Invited)

Published online by Cambridge University Press:  10 February 2011

Ch. Hollenstein ,
A. A. Howling ,
C. Courteille ,
J.-L. Dorier ,
L. Sansonnens ,
D. Magni  and
H. Müller
Ch. Hollenstein
Affiliation:
Centre de Recherches en Physique des Plasmas, Ecole Polytechnique Fédérale de Lausanne, PPB - Ecublens, CH-1015 Lausanne, Switzerland
A. A. Howling
Affiliation:
Centre de Recherches en Physique des Plasmas, Ecole Polytechnique Fédérale de Lausanne, PPB - Ecublens, CH-1015 Lausanne, Switzerland
C. Courteille
Affiliation:
Centre de Recherches en Physique des Plasmas, Ecole Polytechnique Fédérale de Lausanne, PPB - Ecublens, CH-1015 Lausanne, Switzerland
J.-L. Dorier
Affiliation:
Centre de Recherches en Physique des Plasmas, Ecole Polytechnique Fédérale de Lausanne, PPB - Ecublens, CH-1015 Lausanne, Switzerland
L. Sansonnens
Affiliation:
Centre de Recherches en Physique des Plasmas, Ecole Polytechnique Fédérale de Lausanne, PPB - Ecublens, CH-1015 Lausanne, Switzerland
D. Magni
Affiliation:
Centre de Recherches en Physique des Plasmas, Ecole Polytechnique Fédérale de Lausanne, PPB - Ecublens, CH-1015 Lausanne, Switzerland
H. Müller
Affiliation:
Centre de Recherches en Physique des Plasmas, Ecole Polytechnique Fédérale de Lausanne, PPB - Ecublens, CH-1015 Lausanne, Switzerland
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Abstract

Particle contamination formed in reactive plasmas imposes an upper limit on the rate for particle-free deposition. Conversely, these plasmas could be exploited to produce nanometric clusters and particles for various applications. Infrared absorption spectroscopy has been applied to analyse the chemical composition of suspended particles. Mass spectrometry was also used to investigate cluster formation in these deposition plasmas. In pure silane plasmas, a random model reproduces the measured mass spectra, whereas the rich plasma chemistry in silane/oxygen mixtures shows a remarkable tendency to produce silasesquioxane anions.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 507: Symposium A – Amorphous & Microcrystalline Silicon Technology 1998 , 1998 , 547
Copyright
Copyright © Materials Research Society 1998

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References

REFERENCES

[1] Selwyn, G. S., Plasma Sources Sci. Technol. 3, 340 (1994).Google Scholar
[2] Garscadden, A., Pure & Appl. Chem. 66, 1319 (1994).Google Scholar
[3] Dubost, L., Rhallabi, A., Perrin, J., Schmitt, J. P. M., J. Appl. Phys. 78, 3784 (1995).Google Scholar
[4] Sansonnens, L., Pletzer, A., Magni, D., Howling, A. A., Hollenstein, Ch., and Schmitt, J. P. M., Plasma Sources Sci. Technol. 6, 170 (1997).Google Scholar
[5] Meiling, H., Sark, W. G. J. H. M. Van, Bezemer, J. and Weg, W. F. Van der, J. Appl. Phys. 80, 3546 (1996).Google Scholar
[6] Geha, S. G., Carlile, R. N., O'Hanlon, J. F. and Selwyn, G. S., J. Appl. Phys. 72, 374 (1992).Google Scholar
[7] Jellum, G. M., Daugherty, J. E., and Graves, D. B., J. Appl. Phys. 69, 6923 (1991).Google Scholar
[8] Hollenstein, Ch., Howling, A. A., Courteille, C., Magni, D., Scholz, S. Kroesen, G. M. W., Simons, N., Zeeuw, W. de, Schwarzenbach, W., J. Phys. D: Appl. Phys. 31, 74 (1998).Google Scholar
[9] Courteille, C., Magni, D., Deschenaux, Ch., Fayet, P., Howling, A. A., and Hollenstein, Ch., to appear in 41st. Annual Technical Conf. Proc. of the Soc. of Vacuum Coaters, April 1998, Boston.Google Scholar
[10] Bohren, C., Absorption and Scattering of Light by Small Particles, John Wiley & Sons, 1983.Google Scholar
[11] Howling, A. A., Courteille, C., Dorier, J.-L., Sansonnens, L., and Hollenstein, Ch., Pure & Appl. Chem. 68, 1017 (1996).Google Scholar
[12] Watanabe, M. O., Murakami, H., Miyazaki, T., and Kanazama, T., Appl. Phys. Lett. 71, 1207 (1997).Google Scholar
[13] Hollenstein, Ch., Schwarzenbach, W., Howling, A. A., Courteille, C., Dorier, J.-L. and Sansonnens, L., J. Vac. Sci. Technol. A 14, 535 (1996).Google Scholar
[14] Perrin, J., Böhm, Ch., Etemadi, R. and Lloret, A., Plasma Sources Sci. Technol. 3, 252 (1994).Google Scholar
[15] Mandich, M. L. and Reents, W. D., J. Chem. Phys. 96, 4233 (1992).Google Scholar
[16] Aebi, B., Calzaferri, G., Herren, D., Imhof, R. and Schlunegger, U. P., Rapid Comm. Mass Spectrom. 10, 1607 (1996).Google Scholar
[17] Martin, T. P. and Schaber, H., J. Chem. Phys. 83, 855 (1985).Google Scholar
[18] Boufendi, L., Bouchoule, A., Plasma Sources Sci. Technol. 3, 262 (1994).Google Scholar
[19] Sansonnens, L., Howling, A. A., Hollenstein, Ch., Dorier, J.-L. and Kroll, U., J. Phys. D: Appl. Phys. 27, 1406 (1994).Google Scholar
[20] Kessels, W. M. M., Sanden, M.C.M. van de and Schram, D. C., to appear in Appl. Phys. Lett.Google Scholar
[21] Dawson, P. H. (ed.) Quadrupole Mass Spectrometry and its Applications, Elsevier Scientific, 1976, p20.Google Scholar
[22] Eppler, H., Müller, N., Rettinghaus, G., Balzers Instruments, Liechtenstein, private communication.Google Scholar
[23] Howling, A. A., Sansonnens, L., Dorier, J.-L., and Hollenstein, Ch., J. Appl. Phys. 75, 1340 (1994).Google Scholar
[24] Parilis, E. S. et al., Atomic collisions on solid surfaces, Elsevier Science Publishers, 1993, p392.Google Scholar
[25] Goodings, J. M., Jones, J. M., and Parkes, D. A., Int. J. Mass Spectrom. Ion Phys. 9, 417 (1972).Google Scholar
[26] Illenberger, E. and Momigny, J., Gaseous Molecular Ions, Steinkopff, 1992, Part III.Google Scholar
[27] Veprek, S., Schopper, K., Ambacher, O., Rieger, W. and Veprek-Heijman, M. G. J., J. Electrochem. Soc. 140, 1935 (1993).Google Scholar
[28] Watanabe, Y., Plasma Phys. Control. Fusion 39, A59 (1997).Google Scholar
[29] Choi, S. J. and Kushner, M. J., J. Appl. Phys. 74, 853 (1993).Google Scholar
[30] Friedlander, S. K., Smoke, Dust and Haze. Fundamentals of Aerosol Behavior Wiley, New York, 1977.Google Scholar
[31] Courteille, C., Hollenstein, Ch., Dorier, J.-L., Gay, P., Schwarzenbach, W., Howling, A. A., Bertran, E., Viera, G., Martins, R., and Macarico, A., J. Appl. Phys. 80, 2069 (1996).Google Scholar
[32] Goree, J., Plasma Sources Sci. Technol. 3, 400 (1994).Google Scholar
[33] Cabarrocas, P. Roca i, Gay, P., and Hadjadi, A., J. Vac. Sci. Technol. A 14, 655 (1996).Google Scholar
[34] Tanenbaum, D. M., Laracuente, A. L., and Gallagher, A., Appl. Phys. Lett. 68, 1705 (1996).Google Scholar
[35] Ikezi, H., Phys. Fluids 29, 1764 (1986).Google Scholar
[36] Dorier, J.-L., Hollenstein, Ch., and Howling, A. A., J. Vac. Sci. Technol. A. 13, 918 (1995).Google Scholar