We propose a new general principle of operation for solid state devices, and demonstrate a novel transistor which we call a Double Injection Field Effect Transistor, based on this principle. We have fabricated amorphous silicon alloy double injection transistors, operating on the modulation of a double injection current by a gate field covering the complete path of the current channel.

Using these amorphous silicon alloy double injection transistors, we have achieved currents over fourteen times those theoretically possible for conventional amorphous silicon field effect transistors operating under similar conditions. This new principle, applicable to both thin film amorphous and crystalline devices, offers the potential of high current, high speed field effect transistors.