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Direct Observation of A 7×7 Superstructure Buried at the Amorphous-Si / Si(111) Interface

Published online by Cambridge University Press:  25 February 2011

Akira Sakai
Affiliation:
Fundamental Research Laboratories, NEC Corporation, 34, Miyukigaoka, Tsukuba, lbaraki 305, Japan
Toru Tatsumi
Affiliation:
Microelectronics Research Laboratories, NEC Corporation, 4-1-1, Miyazaki, Miyamae-ku, Kawasaki, Kanagawa 213, Japan
Koichi Ishida
Affiliation:
Fundamental Research Laboratories, NEC Corporation, 34, Miyukigaoka, Tsukuba, lbaraki 305, Japan
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Abstract

Direct imaging of a 7×7 superstructure buried at the interface between amorphous-Si and a Si(111) substrate was demonstrated by cross-sectional high resolution transmission electron microscopy (HRTEM). The electron diffraction pattern of the interface region in cross-section geometry showed diffuse streaks of fractional order which suggested the existence of the superstructure at the interface. The <110> cross-sectional HRTEM image showed the atomic configuration of the projected interface superstructure, which had a periodicity of 23 Å along the interface. Such periodicity corresponds to 7 times the 1/3{224} periodicity which is 3.3 Å at the interface. The interface atomic model of the buried 7×7 superstructure was also proposed by using the image matching technique between the experimental and computer simulated images.

Type
Research Article
Copyright
Copyright © Materials Research Society 1990

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References

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