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Depth Gradients in Porous Silicon: How to Measure Them and How to Avoid Them

Published online by Cambridge University Press:  15 February 2011

M. Thönissen ,
M. G. Berger ,
W. Theiβ ,
S. Hilbrich ,
M. Krüger ,
R. Arens-Fischer ,
S. Billat ,
G. Lerondel  and
H. Lüth
M. Thönissen
Affiliation:
KFA Jülich, ISI, D-52425 Jülich, Germany
M. G. Berger
Affiliation:
KFA Jülich, ISI, D-52425 Jülich, Germany
W. Theiβ
Affiliation:
RWTH Aachen, I. Physik. Inst., D-52056 Aachen, Germany
S. Hilbrich
Affiliation:
RWTH Aachen, I. Physik. Inst., D-52056 Aachen, Germany
M. Krüger
Affiliation:
KFA Jülich, ISI, D-52425 Jülich, Germany
R. Arens-Fischer
Affiliation:
KFA Jülich, ISI, D-52425 Jülich, Germany
S. Billat
Affiliation:
KFA Jülich, ISI, D-52425 Jülich, Germany
G. Lerondel
Affiliation:
Université J. Fourier, B.p. 87, F-38402 St. Martin d'Hères cedex France
H. Lüth
Affiliation:
KFA Jülich, ISI, D-52425 Jülich, Germany
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Abstract

For the formation of single layers and layer systems the depth homogeneity of porous silicon (PS) plays a key role. We have measured qualitatively and quantitatively structural gradients in p-PS layers with increasing layer thicknesses by fitting reflectance spectra in the infrared and by measuring thickness oscillations in the reflectance during the formation of PS layers. These results allow us to give recipes for the formation of PS layers with a homogenous optical thickness in depth.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 452 , 1996 , 431
Copyright
Copyright © Materials Research Society 1997

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References

REFERENCES

1.Berger, M.G., PhD thesis “Poröses Silicium für die Mikrooptik: Herstellung, Mikrostruktur und optische Eigenschaften von Einzelschichten und Schichtsystemen”, RWTH Aachen, (1996)Google Scholar
2.Berger, M.G., Arens-Fischer, R., Thönissen, M., Hilbrich, S., Theiβ, W., Krüger, M., Billat, S., Grosse, P., Lüth, H., Thin Solid Films, acceptedGoogle Scholar
3.Billat, S., Thönissen, M., Krüger, M., Berger, M.G., Lüth, H., Thin Solid Films, acceptedGoogle Scholar
4.Thönissen, M., Billat, S., Frotscher, U., Rossów, U., Krüger, M., Lüth, H., Berger, M.G., J. Appl. Phys. 80(5), (1996), 2990–2993Google Scholar
5.Tumer, D.R., J. Electrochem. Soc, 107, 810, (1960)Google Scholar
6.Hu, S.M., Kerr, D.R., J. Electrochem. Soc, 14, 414, (1967)Google Scholar
7.Lehmann, V., J. Electrochem. Soc, 140 (10), 2836, (1993)Google Scholar
8.Theiβ, W., The use of effective medium theories in optical spectroscopy, Helbig, R. (editor), Advances in Solid State Physics, 33, p. 149, ViewegGoogle Scholar
9.Looyenga, , Physica 31, 401 (1965)Google Scholar
10.Thönissen, M., Berger, M.G., Arens-Fischer, R., Krüger, M., Glück, O., Lüth, H., Theiβ, W., Wernke, M., Thin Solid Films, 276 (1996), 21–24Google Scholar
11.Halimaoui, A., Surf. Sci. Lett., 306, L550 (1994)Google Scholar
12.Berger, M.G., Frohnhoff, S., Theiβ, W., Rossów, U., Münder, H., Porous silicon science and technology, ISBN 3–540–58936–8, Springer (1994), p. 345Google Scholar
13.Berger, M.G., Dieker, C., Thönissen, M., Vescan, L., Lüth, H., Münder, H., Theiβ, W., Wernke, M., Grosse, P., J. Phys. D: Appl. Phys., 27, 1333, (1994)Google Scholar