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Deposition Kinetics of a-Si:H and a-SiC:H for Fabrication of a-Si / a-SiC Double-Layered Photoreceptor

Published online by Cambridge University Press:  26 February 2011

Tatsuo Nakanishi
Affiliation:
Copier Supplies Division, Konica Corporation No. 2970, Ishikawa-cho, Hachiooji-shi, Tokyo 192, JAPAN
Yuuji Marukawa
Affiliation:
Copier Supplies Division, Konica Corporation No. 2970, Ishikawa-cho, Hachiooji-shi, Tokyo 192, JAPAN
Satoshi Takahashi
Affiliation:
Copier Supplies Division, Konica Corporation No. 2970, Ishikawa-cho, Hachiooji-shi, Tokyo 192, JAPAN
Toshinori Yamazaki
Affiliation:
Copier Supplies Division, Konica Corporation No. 2970, Ishikawa-cho, Hachiooji-shi, Tokyo 192, JAPAN
Hiroyuki Moriguchi
Affiliation:
Copier Supplies Division, Konica Corporation No. 2970, Ishikawa-cho, Hachiooji-shi, Tokyo 192, JAPAN
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Extract

In the fabrication of a-Si photoreceptor for electrophotography (Fig.1), it is important to understand physical and chemical reactions in glow-discharge plasma [1] in order to improve film quality and to achieve high deposition rate [2] and uniformity of the film, because of its thickness of about 30 μm and large area.

Type
Research Article
Copyright
Copyright © Materials Research Society 1988

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References

1. Yamazaki, T., Nakanishi, T., Narukawa, Y., Takahashi, S. and Moriguchi, H., Proc. 5th Plasma Processing Conf., (Kanagawa, 1988) 131.Google Scholar
2. Yamazaki, T., Takahashi, S., Nakanishi, T., Narukawa, V. and Noriguchi, H., Proc. 30th Anniversary Conf. of Soc. Electrophotography jpn.,(Tokyo, 18 May 1988).Google Scholar
3. Schmitt, J.P.M., J. Non-Cryst. Solids 59&60, 649 (1983).CrossRefGoogle Scholar
4. Perrin, J., Schmitt, J.P.M., De Rosny, G., Drevillon, B., Huc, J. and Lloret, A., Chem. Phys. 73, 383 (1982).CrossRefGoogle Scholar
5. Marukawa, V., Nakanishi, T., Takahashi, S., Yamazaki, T. and Moriguchi, H., Proc. 60th Con. of Soc. Electrophotography jpn.,(Oosaka, 1987) 36, in Japanese.Google Scholar