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Controlled Modification of Erbium Lifetime in Silicon Dioxide Film with Chromium or Titanium Coatings

Published online by Cambridge University Press:  01 February 2011

Nanfang Yu
Affiliation:, Harvard University, School of Engineering and Applied Sciences, 24 Peabody Terrace, Room 304, Cambridge, MA, 02138, United States, 6172331712
Jiming Bao
Affiliation:, Harvard University, School of Engineering and Applied Sciences, Cambridge, MA, 02138, United States
Alexey Belyanin
Affiliation:, Texas A&M University, Department of Physics, College Station, TX, 77843, United States
Thomas Mates
Affiliation:, University of California, Santa Barbara, Materials Department, Santa Barbara, CA, 93106, United States
Mariano Troccoli
Affiliation:, Argos Tech, LLC, Santa Clara, CA, 95051, United States
Federico Capasso
Affiliation:, Harvard University, School of Engineering and Applied Sciences, Cambridge, MA, 02138, United States
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We report systematic measurements of the lifetime of the 1.54 μm transition of erbium implanted at different energies in SiO2 films coated with titanium or chromium. The lifetime shows a strong reduction up to a factor of 20 with decreasing distance between the erbium and the metal coating. Our experiments combined with rigorous theoretical modeling demonstrate that a high degree of control over the radiative properties of erbium can be achieved in erbium-implanted materials.


Research Article
Copyright © Materials Research Society 2008

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1. Desurvire, E., Erbium-Doped Fiber Amplifiers, Principles and Applications, (Wiley-Interscience, New York, 2002), Chap. 4, pp. 233; Chap. 6, pp. 455.Google Scholar
2. Polman, A., Min, B., Kalkman, J., Kippenberg, T. J., and Vahala, K. J., Appl. Phys. Lett. 84, 1037 (2004).Google Scholar
3. Polman, A., J. Appl. Phys. 82, 1 (1997).Google Scholar
4. Hinds, E. A., Advances in Atomic, Molecular, and Optical Physics. (Academic, Boston, 1991), Vol. 28, pp. 237.Google Scholar
5. Meschede, D., Phys. Reports. 211, 201 (1992).Google Scholar
6. Suemune, I., Ueta, A., Avramescu, A., Tanaka, S., Kumano, H., and Uesugi, K., Appl. Phys. Lett. 74, 1963 (1999).Google Scholar
7. Quang, T., Woldeyohannes, M., John, S., and Agarwal, G. S., Phys. Rev. Lett. 79, 5238 (1997).Google Scholar
8. Vahala, K.J., Nature 424, 839 (2006).Google Scholar
9. Chance, R. R., Prock, A., and Silbey, R., Advances in Chemical Physics, Advances in Chemical Physics (Wiley, New York, 1978), Vol. XXXVII, pp. 1.Google Scholar
10. Drexhage, K. H., Kuhn, H. and Schafer, F. P., Ber. Bunsenges. Phys. Chem. 72, 329 (1968); R. R. Chance, A. Prock, and R. Silbey, J. Chem. Phys. 60, 2184 (1974).Google Scholar
11. Snoeks, E., Lagendijk, A., and Polman, A., Phys. Rev. Lett. 74, 2459 (1995).Google Scholar
12. Belyanin, A. A., Kocharovsky, V. V. VI. Kocharovsky, V., and Capasso, F., Phys. Rev. Lett. 88, 053602 (2002).Google Scholar
13. Brokmann, X., Coolen, L., Dahan, M., and Hermier, J. P., Phys. Rev. Lett. 93, 107403 (2004).Google Scholar
14. Kocharovsky, V.V. VI. Kocharovsky, V., and Belyanin, A.A., Phys. Rev. Lett. 76, 3285 (1996).Google Scholar
15. Belyanin, A. A., Kocharovsky, V. V. VI., and Kocharovsky, V., Laser Phys. 5,1164 (1996).Google Scholar
16. Kalkman, J., Kuipers, L., Polman, A., and Gersen, H., Appl. Phys. Lett. 86, 041113 (2005).Google Scholar
17. Vredenberg, A. M., Hunt, N. E. J., Schubert, E. F., Jacobson, D. C., Poate, J. M. and Zydzik, G. J., Phys. Rev. Lett. 71, 517 (1993).Google Scholar
18. Johnson, P.B. and Christy, R.W., Phys. Rev. B 9, 5056 (1974).Google Scholar
19. Dood, M. J. A. de, Slooff, L. H., Polman, A., Moroz, A., and Blaaderen, A. van, Phys. Rev. A, 64, 033807 (2001).Google Scholar