Hostname: page-component-848d4c4894-pjpqr Total loading time: 0 Render date: 2024-06-24T00:26:20.316Z Has data issue: false hasContentIssue false

Collisional Effects of Background Gases on Pulsed Laser Deposition Plasma Beams

Published online by Cambridge University Press:  21 February 2011

David B. Geohegan
Affiliation:
Oak Ridge National Laboratory, P.O. Box 2008, Oak Ridge, TN 37831-6056.
Alex A. Puretzky
Affiliation:
Institute of Spectroscopy, Russian academy of Sciences, Troitsk, Russi A.
Get access

Abstract

The penetration of energetic pulsed ablation plumes through ambient gases is experimentally characterized to investigate a general phenomenon believed to be important to film growth by pulsed laser deposition (PLD). Under typical PLD conditions involving background gases, the ion flux in the ablation plume is observed to split into distinct fast and slow components over a limited range of distances1,2 the fast component is transmitted with near-initial velocities and high kinetic energies, potentially damaging to growing films at these distances. Formation of the second, significantly-slowed component correlates with the bright contact front3 formation observed1,4 in fast ICCD imaging studies. This general effect is explored in detail for the case of yttrium ablation into argon, a single-element target into an inert gas.5 Time-resolved optical absorption spectroscopy and optical emission spectroscopy are employed to simultaneously view the populations of both excited and ground states of Y and Y+ for comparison with quantitative intensified-CCD photography of the visible plume luminescence and ion flux measurements made with fast ion probes during this phenomenon. these measurements confirm that, in addition to the bright significantly-slowed front which has been described by shock or drag propagation models1, a fast-component of target material is transmitted to extended distances for some ambient pressures with near-initial velocities.

Type
Research Article
Copyright
Copyright © Materials Research Society 1995

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 Geohegan, D. B., p. 28 in Laser ablation: Mechanisms and applications, ed. by Miller, J. C. and Haglund, R. F., Springer-Verlag, Heidelberg, (1991).Google Scholar
2 Geohegan, D. B., Ch. 5. IN Pulsed Laser Deposition of Thin Films, Chrisey, D. B. and Hubler, G. K. (eds.), Wiley, New York (1994) and references cited therein.Google Scholar
3 Roger, Kelly and Antonio, Miotello, (Ibid).Ch. 3.Google Scholar
4 Geohegan, D. B., Appl. Phys. Lett. 60, 2732 (1992).Google Scholar
5 Geohegan, D.B. and Puretzky, A.A., submitted to appl. Phys. Lett. . (1995).Google Scholar
6 Geohegan, D. B.,thin Solid Films . 220, 138 (1992).Google Scholar
7 Geohegan, D. B., p. 73 in Laser ablation of Electronic Materials: Basic Mechanisms and applications, ed. by Fogarassy, E. and Lazare, S., North Holland (1992).Google Scholar
8 Kools, J. C. S., J. appl. Phys. 74, 6401 (1993).Google Scholar
9 Geohegan, D. B., pp. 165185 in Excimer Lasers, NATO aSI Series E: applied Sciences Vol. 265, Laude, L. D. (éd.). Kluwer, Netherlands (1994).Google Scholar
10 Geohegan, D. B. and Mashburn, D. N., Appl. Phys. Lett. 55, 2345 (1989).Google Scholar
11 Goforth, R. R. and Koopman, David W., Phys. Fluids 17, 698 (1974).Google Scholar
12 Koopman, David W. and Goforth, R. R., Phys. Fluids 17, 1560 (1974).Google Scholar
13 Koopman, David W., Phys. Fluids. 15, 1959 (1972).Google Scholar