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Chemical Vapor Deposition of Ruthenium and Osmium Films from Mono- and bis-(Cyclopentadienyl) Complexes as Precursors

Published online by Cambridge University Press:  15 February 2011

Christopher J. Smart ,
Akshaya Gulhati  and
Scott K. Reynolds
Christopher J. Smart
Affiliation:
Vassar College, Poughkeepsie, NY
Akshaya Gulhati
Affiliation:
Vassar College, Poughkeepsie, NY
Scott K. Reynolds
Affiliation:
IBM-TJ Watson Research Center, Yorktown Heights, NY.
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Abstract

We have investigated cyclopentadienyl (Cp) complexes of Ru and Os as precursors for low temperature CVD of pure ruthenium and osmium films. Films were grown on a variety of substrates in a warm-walled CVD reactor, equipped with a resistively heated wafer chuck, massflow controllers for carrier gas regulation, and a mechanically-backed oil-vapor diffusion pump. Typical depositions were done under ca. 1 Torr total pressure. Use of air or oxygen as a carrier gas and Cp2M (M = Ru or Os) as precursors gave high purity, conformal films of ruthenium and osmium at temperatures as low as 275°C and 350°C, respectively. Under these conditions, the only observable by-products were CO2 and H2O, indicating that surface-catalyzed, complete oxidation of the ligands was involved in the decomposition process. Growth rates, film purities, resistivities and conformality were measured.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 363 , 1994 , 207
Copyright
Copyright © Materials Research Society 1995

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