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The Charge State of Iron Ions Implanted Into Sapphire

Published online by Cambridge University Press:  26 February 2011

C. J. Mchargue
Affiliation:
Oak Ridge National Laboratory, P.O. Box X, Oak Ridge, TN 37831 USA
P. S. Sklad
Affiliation:
Oak Ridge National Laboratory, P.O. Box X, Oak Ridge, TN 37831 USA
C. W. White
Affiliation:
Oak Ridge National Laboratory, P.O. Box X, Oak Ridge, TN 37831 USA
G. C. Farlow
Affiliation:
Wright State University, Dayton, OH 45435 USA
A. Perez
Affiliation:
Universite Claude Bernard Lyon I, Villeurbanne Cedex, France
N. Kornilios
Affiliation:
Universite Claude Bernard Lyon I, Villeurbanne Cedex, France
G. Marest
Affiliation:
Universite Claude Bernard Lyon I, Villeurbanne Cedex, France
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Abstract

Single crystals of α-Al2O3 were implanted with 57Fe+ at room temperature to fluences ranging from 1016 to 1017 ions/cm2. The damage in the implanted zone and the valence states and local environment of implanted ions were studied by transmission electron microscopy, Rutherford backscattering-channelling, and conversion electron Mössbauer spectroscopy. The implanted iron was distributed among the three charge states Fe2+, Fe3+, and Fe°(metallic clusters) with the relative amount of each varying with concentration of implanted iron.

Type
Research Article
Copyright
Copyright © Materials Research Society 1988

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References

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