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Charge Carrier Recombination in AlGaAs Studied by Time-Resolved Microwave Conductivity Experiments

Published online by Cambridge University Press:  28 February 2011

A. Werner
Affiliation:
Boston University, College of Engineering, Boston, MA 02215, USA
A. M. Agarwal
Affiliation:
Boston University, College of Engineering, Boston, MA 02215, USA
T. D. Moustakas
Affiliation:
Boston University, College of Engineering, Boston, MA 02215, USA
M. Kunst
Affiliation:
Hahn-Meitner-Institut, D-1000 Berlin 39, W., Germany
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Abstract

AlxGa1-xAs films, doped with silicon in the 1 x 1018 cm-3 range, have been prepared in the composition range x = 0.20 - 0.46 by molecular beam epitaxy. The influence of defect states on excess carrier trapping and recombination processes is studied by a contactless transient photoconductivity technique in the microwave region. Effective electron life- times in the 1 x 10-5s range for the 20% Al film down to the 1 x 10-7s range for the 46% Al film were found, indicating a larger density of electron traps in more Al rich films. The decay kinetics in AlGaAs is compared with the decay kinetics in GaAs.

Type
Research Article
Copyright
Copyright © Materials Research Society 1989

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