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Characterization of Surface Cleans by Surface Photovoltage and Surface Charge Imaging
Published online by Cambridge University Press: 21 February 2011
Abstract
To monitor the effectiveness of standard cleaning processes in semiconductor manufacturing, suitable diagnostic procedures must be found. In addition the procedures must be non-contact and non-destructive. Increasingly the techniques of surface photovoltage and surface charge imaging together are finding applications as in-line wafer monitors. This talk will discuss how they are being used to monitor the quality of surface cleaning processes. We will show that if unchecked the "clean" may actually contribute contamination.
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- Research Article
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- Copyright © Materials Research Society 1993
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