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Atmospheric Stability of E-Beam Deposited Optical Thin Film Stacks

Published online by Cambridge University Press:  01 February 2011

Ping Hou
Affiliation:
Nortel Networks Corp., Wilmington, MA 01887
Lianchao Sun
Affiliation:
Sun International (USA), Acton, MA 01720
Fei Luo
Affiliation:
Electrical and Computer Engineering, Boston University, Boston, MA 02215
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Abstract

Optical thin films with SiO2-TiO2 stack were prepared by the technology of electron beam (e-beam) evaporation with ion beam assistant deposition (IBAD). The mechanical (stress) and optical properties of as-deposited thin films were studied as a function of exposure time in the atmospheric environment. Exposing to the air at the ambient temperature causes incremental compressive stress and spectrum profile changes, which is related to the absorption of water moisture into the films. Making a dense film is, therefore, a practical approach to improve structural stability of thin films and then the performance of optical devices.

Type
Research Article
Copyright
Copyright © Materials Research Society 2005

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