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X-ray reflectometry investigation of interfacial structure of CrAlN/TiAlN multilayers

Published online by Cambridge University Press:  27 September 2016

Xiaoming Du ,
Minpeng Wang ,
Gang Zhang ,
Yan Wang ,
Xinxi Li  and
Chaoqiang Huang
Xiaoming Du*
Affiliation:
School of Materials Science and Engineering, Shenyang Ligong University, Shenyang 110159, China
Minpeng Wang
Affiliation:
School of Materials Science and Engineering, Shenyang Ligong University, Shenyang 110159, China
Gang Zhang
Affiliation:
School of Materials Science and Engineering, Shenyang Ligong University, Shenyang 110159, China
Yan Wang
Affiliation:
Institute of Nuclear Physics and Chemistry, China Academy of Engineering Physics, Mianyang 621900, China
Xinxi Li
Affiliation:
Institute of Nuclear Physics and Chemistry, China Academy of Engineering Physics, Mianyang 621900, China
Chaoqiang Huang
Affiliation:
Institute of Nuclear Physics and Chemistry, China Academy of Engineering Physics, Mianyang 621900, China
*
Address all correspondence to X.M. Du at du511@163.com
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Abstract

TiAlN, CrAlN films and alternate CrAlN/TiAlN multilayers with different repeated bilayer thickness ranging from 10 to 30 nm were prepared by reactive magnetron sputtering. The interface structures of the films were characterized using x-ray reflectometry method. The individual thickness of the repeated bilayers in multilayers and total thickness of the films are close to the nominal thickness and they are more accurate for thicker films. The interface roughness increases as the thickness of the repeated bilayer in mutilayers decreases. The scattering length density profiles of the films suggests that the chemical composition is more accurate for thicker films.

Type
Research Letters
Information
MRS Communications , Volume 6 , Issue 4 , December 2016 , pp. 408 - 415
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Copyright
Copyright © Materials Research Society 2016 

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