Hostname: page-component-8448b6f56d-tj2md Total loading time: 0 Render date: 2024-04-23T21:14:35.371Z Has data issue: false hasContentIssue false

Dielectric behavior related to TiOx phase change to TiO2 in TiOx/Al2O3 nanolaminate thin films

Published online by Cambridge University Press:  13 May 2014

Geunhee Lee*
Affiliation:
Department of Materials Science and Engineering, University of Texas at Dallas, Richardson, Texas 75080; Institute for Functional Nanomaterials, University of Puerto Rico, San Juan, Puerto Rico 00931-3343
Ram S. Katiyar
Affiliation:
Institute for Functional Nanomaterials, University of Puerto Rico, San Juan, Puerto Rico 00931-3343
Bo-Kuai Lai
Affiliation:
Lake Shore Cryotronics, Westerville, Ohio 43082
Charudatta Phatak
Affiliation:
Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439
Orlando Auciello*
Affiliation:
Department of Materials Science and Engineering, University of Texas at Dallas, Richardson, Texas 75080
*
Address all correspondence to Geunhee Lee atgeunhee.lee@utdallas.eduand Orlando Aucielloorlando.auciello@utdallas.edu
Address all correspondence to Geunhee Lee atgeunhee.lee@utdallas.eduand Orlando Aucielloorlando.auciello@utdallas.edu
Get access

Abstract

We previously demonstrated that TiOx/Al2O3 nanolaminates (TAO NL) exhibit abnormally high-dielectric constant k (800–1000), due to Maxwell–Wagner polarization, via charge accumulation at insulating Al2O3/semiconducting TiOx interfaces. Here, we report TAO NL dielectric properties related to TiOx phase change in TiOx (0.9 nm)/Al2O3 (0.1 nm) NL. High-resolution transmission electron microscopy shows amorphous TiOx phase change to crystalline anatase TiO2 due to free-energy minimization. The phase change induce reduction in leakage current and dielectric loss (J = 10−2 to 10−4 A/cm2, tan δ = 10 to 10−1), still with k ~ 600 up to MHz, compared to amorphous TAO NLs.

Type
Research Letters
Copyright
Copyright © Materials Research Society 2014 

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1.Moore, G.E.: Integrated circuits. Proc. IEEE 86, 82 (1998).Google Scholar
2.Pint, C.L., Nicholas, N.W., Xu, S., Sun, Z., Tour, J.M., Schmidt, H.K., Gordon, R.G., and Hauge, R.H.: Three dimensional solid-state supercapacitors from aligned single-walled carbon nanotube array templates. Carbon 49, 4890 (2011).Google Scholar
3.Meng, F. and Ding, Y.: Sub-micrometer-thick all-solid-state supercapacitors with high power and energy densities. Adv. Mater. 23, 4098 (2011).Google Scholar
4.Osada, M., Akatsuka, K., Ebina, Y., Funakubo, H., Ono, K., Takada, K., and Sasaki, T.: Robust high-k response in molecularly thin perovskite nanosheets. ACS Nano 4, 5225 (2010).CrossRefGoogle Scholar
5.Sanchez, D.A., Kumar, A., Ortega, N., Katiyar, R.S., and Scott, J.F.: Near-room temperature relaxor multiferroic. Appl. Phys. Lett. 97, 202910 (2010).Google Scholar
6.Podpirka, A. and Ramanathan, S.: Thin film colossal dielectric constant oxide La2−xSrxNiO4: synthesis, dielectric relaxation measurements, and electrode effects. J. Appl. Phys. 109, 014106 (2011).CrossRefGoogle Scholar
7.Homes, C.C., Vogt, T., Shapiro, S.M., Wakimoto, S., and Ramirez, A.P.: Optical response of high-dielectric-constant perovskite-related oxide. Science 293, 673 (2001).CrossRefGoogle ScholarPubMed
8.Lee, G., Lai, B-K., Phatak, C., Katiyar, R.S., and Auciello, O.: Interface-controlled high dielectric constant Al2O3/TiOx nanolaminates with low loss and low leakage current density for new generation nanodevices. J. Appl. Phys. 114, 124307 (2013).Google Scholar
9.Lee, G., Lai, B-K., Phatak, C., Katiyar, R.S., and Auciello, O.: Tailoring dielectric relaxation in ultra-thin high-dielectric constant nanolaminates for nanoelectronics. Appl. Phys. Lett. 102, 142091 (2013).Google Scholar
10.Li, W., Auciello, O., Premnath, R.N., and Kabius, B.: Giant dielectric constant dominated by Maxwell–Wagner relaxation in Al2O3/TiO2 nanolaminates synthesized by atomic layer deposition. Appl. Phys. Lett. 96, 162907 (2010).CrossRefGoogle Scholar
11.Ivorra, A.: Remote electrical stimulation by means of implanted rectifiers. PLoS ONE 6, e23456 (2011).Google Scholar
12.Li, W., Chen, Z., Premnath, R.N., Kabius, B., and Auciello, O.: Controllable giant dielectric constant in Al2O3/TiO2 nanolaminates. J. Appl. Phys. 110, 024106 (2011).CrossRefGoogle Scholar
13.Prodromakis, T. and Papavassiliou, C.: Engineering the Maxwell–Wagner polarization effect. Appl. Surf. Sci. 255, 6989 (2009).Google Scholar
14.Aarik, J., Aidla, A., MaE`ndar, H., and Uustare:, T.Atomic layer deposition of titanium dioxide from TiCl4 and H2O: investigation of growth mechanism. Appl. Surf. Sci. 172, 148 (2001).CrossRefGoogle Scholar
15.Kim, W.D., Hwang, G.W., Kwon, O.S., Kim, S.K., Cho, M., Jeong, D.S., Lee, S.W., Seo, M.H., Hwang, C.S., Min, Y-S., and Cho, Y.J.: Growth characteristics of atomic layer deposited TiO2 thin films on Ru and Si electrodes for memory capacitor applications. J. Electrochem. Soc. 152, C552 (2005).Google Scholar
16.Kim, S.K., Hoffmann-Eifert, S., Reiners, M., and Waser, R.: Relation between enhancement in growth and thickness-dependent crystallization in ALD TiO2 thin films. J. Electrochem. Soc. 158, D6 (2011).Google Scholar
17.Pore, V., Ritala, M., Leskelä, M., Saukkonen, T., and Järn, M.: Explosive crystallization in atomic layer deposited mixed titanium oxides. Cryst. Growth Des. 9, 2975 (2009).Google Scholar
18.López, A., Acosta, D., Martínez, A.I., and Santiago:, J.Nanostructured low crystallized titanium dioxide thin films with good photocatalytic activity. Powder Technol. 202, 111 (2010).CrossRefGoogle Scholar
19.Kim, S.K., Choi, G-J., Lee, S.Y., Seo, M., Lee, S.W., Han, J.H., Ahn, H-S., Han, S., and Hwang, C.S.: Al-doped TiO2 films with ultralow leakage currents for next generation DRAM capacitors. Adv. Mater. 20, 1429 (2008).Google Scholar