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Super high-dielectric-constant oxide films for next-generation nanoelectronics and supercapacitors for energy storage

Published online by Cambridge University Press:  11 March 2020

Orlando Auciello ,
Geunhee Lee ,
Chunya Wu ,
Yuanning Chen ,
Jesus J. Alcantar-Peña ,
Israel Mejia  and
Elida de Obaldía
Orlando Auciello
Affiliation:
The University of Texas at Dallas, USA; oha120030@utdallas.edu
Geunhee Lee
Affiliation:
BTI Solutions, dba Blue Telecom Inc., USA; Geunhee.lee@btisolutions.com
Chunya Wu
Affiliation:
The University of Texas at Dallas, USA; cxw170330@utdallas.edu
Yuanning Chen
Affiliation:
MicroSol Technologies Inc., USA; Yuanningc@microSoltech.com
Jesus J. Alcantar-Peña
Affiliation:
Microtechnologies Division, Center for Engineering and Industrial Development, Mexico; jesus.alcantar@cidesi.edu.mx
Israel Mejia
Affiliation:
Microtechnologies Division, Center for Engineering and Industrial Development, Mexico; israel.mejia@cidesi.edu.mx
Elida de Obaldía
Affiliation:
Universidad Tecnológica de Panamá, Republic of Panamá; elida.deobaldia@utp.ac.pa
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Abstract

Dielectrics are electrical insulator materials, polarizable by opposite displacement of positive and negative ionized atoms via electric fields across the material’s thickness. Dielectrics are used in energy-storage capacitors, as key components in modern micro-/nanoelectronics, high-frequency and mobile communication devices, and life-saving microchips and other devices such as defibrillators and pacemakers implantable in humans. A key dielectric parameter is the dielectric constant (k), which largely controls the capacitance in capacitors with nanoscale area and dielectric layer thickness. Extremely high dielectric constants (k ≥1000) were observed in oxides (e.g., La1.8Sr0.12NiO4) with relaxor/ferroelectric materials and in combined semiconducting bulk properties with highly resistive grain boundaries. Giant dielectric constant films have also been demonstrated, based on integrating relatively low-dielectric-constant oxides into nanolaminate structures (e.g., TiOx/Al2O3; TiO2/HfO2) with tailored sublayer thicknesses, interfaces, and oxygen atom distributions. This overview article addresses the science and technology of high-dielectric-constant oxide materials with different compositions and structures.

Type
Technical Feature
Information
MRS Bulletin , Volume 45 , Issue 3: Metasurfaces for Flat Optics , March 2020 , pp. 231 - 238
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Copyright
Copyright © Materials Research Society 2020

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