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A Soft Solution Processing Technique for Preparing Ferrite Films and Their Applications

Published online by Cambridge University Press:  31 January 2011

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“Ferrite plating” is a typical “soft solution processing” (SSP) application; it enables the formation of oxide ferromagnetic films from an aqueous solution at T 24−100°C under atmospheric pressure. Using ferrite plating, we can grow crystallized ferrite films of spinel-type (MFe)3O4 (where M = Fe, Co, Ni, Zn, Al, Cr, etc.) in one step, requiring no heat treatment. This opens the door to fabricating novel ferritefilm devices using substrates of such nonheat-resistant materials as plastics and GaAs integrated circuits; conventional ferrite-film preparation techniques, such as sputtering, vacuum evaporation, molecularbeam epitaxy, liquid-phase epitaxy, and so on, require high temperatures (>∼600°C) for the crystallization of ferrites, which deteriorates the non-heat-resistant substrates. Ferrite plating is a unique technique that allows us to synthesize ferrite “films” by means of a wet chemical process. There are many techniques, for synthesizing ferrite “particles” from aqueous solutions, but no technique, to our knowledge, enables ferrite-film synthesis by a wet chemical process.

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Research Article
Copyright
Copyright © Materials Research Society 2000

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