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Palladium Germanides for Mid- and Long-Wave Infrared Plasmonics

Published online by Cambridge University Press:  22 May 2017

Evan M. Smith ,
William H. Streyer ,
Nima Nader ,
Shivashankar Vangala ,
Richard Soref ,
Daniel Wasserman  and
Justin W. Cleary
Evan M. Smith*
Affiliation:
KBRwyle, Beavercreek, OH, 45431, USA Air Force Research Laboratory, Sensors Directorate, Wright-Patterson Air Force Base, Ohio, 45433, USA
William H. Streyer
Affiliation:
Department of Electrical and Computer Engineering, University of Illinois, Urbana-Champaign, IL, 61801, USA
Nima Nader
Affiliation:
Air Force Research Laboratory, Sensors Directorate, Wright-Patterson Air Force Base, Ohio, 45433, USA Solid State Scientific Corporation, Nashua, NH 03060, USA
Shivashankar Vangala
Affiliation:
Air Force Research Laboratory, Sensors Directorate, Wright-Patterson Air Force Base, Ohio, 45433, USA Azimuth Corporation, Dayton, OH 45431, USA
Richard Soref
Affiliation:
The Engineering Program, University of Massachusetts at Boston, MA 02125, USA
Daniel Wasserman
Affiliation:
Department of Electrical and Computer Engineering, University of Texas Austin, Austin, TX 78758, USA
Justin W. Cleary
Affiliation:
Air Force Research Laboratory, Sensors Directorate, Wright-Patterson Air Force Base, Ohio, 45433, USA
*
*(Email: evan.smith.31.ctr@us.af.mil)

Abstract

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Palladium germanide thin films were investigated for infrared plasmonic applications. Palladium thin films were deposited onto amorphous germanium thin films and subsequently annealed at a range of temperatures. X-ray diffraction was used to identify stoichiometry, and Scanning Electron Micrographs, along with Energy Dispersive Spectroscopy (EDS) was used to characterize composition and film quality. Resistivity was also measured for analysis. Complex permittivity spectra were measured from 0.3 to 15 µm using IR ellipsometry. From this, surface plasmon polariton (SPP) characteristics such as propagation length and mode confinement were calculated and used to determine appropriate spectral windows for plasmonic applications with respect to film characteristics. Films were evaluated for use with on-chip plasmonic components.

Keywords

x-ray diffraction (XRD)optical propertiesthin film
Type
Articles
Information
MRS Advances , Volume 2 , Issue 44: Electronic Devices and Materials , 2017 , pp. 2385 - 2390
Copyright
Copyright © Materials Research Society 2017 

References

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