Hostname: page-component-848d4c4894-ttngx Total loading time: 0 Render date: 2024-05-14T08:30:46.832Z Has data issue: false hasContentIssue false
  • English
  • Français

Addressing the Challenges of Using Ferromagnetic Electrodes in Molecular Devices

Published online by Cambridge University Press:  24 February 2016

Pawan Tyagi ,
Edward Friebe  and
Collin Baker
Pawan Tyagi*
Affiliation:
University of the District of Columbia, Department of Mechanical Engineering, 4200 Connecticut Avenue NW Washington DC-20008, USA University of Kentucky, Department of Chemical and Materials Engineering 177 F. Paul Anderson Hall, Lexington KY-40506
Edward Friebe
Affiliation:
University of the District of Columbia, Department of Mechanical Engineering, 4200 Connecticut Avenue NW Washington DC-20008, USA
Collin Baker
Affiliation:
University of the District of Columbia, Department of Mechanical Engineering, 4200 Connecticut Avenue NW Washington DC-20008, USA
*
*Email of corresponding author: ptyagi@udc.edu
Get access

Abstract

Ferromagnetic (FM) electrodes chemically anchored with thiol functionalized molecules can yield novel molecular spintronics devices (MSDs). However, significant challenges lie in developing commercially viable MSD fabrication approach utilizing FM electrodes. A practical MSD fabrication approach should consider FM electrodes’ susceptibility to oxidation, chemical etching, and stress induced deformations during fabrication and usage. This paper will discuss NiFe, an alloy used in the present day memory devices and high-temperature engineering applications, as a candidate for FM electrode and for the fabrication of MSDs. Our spectroscopic reflectance studies show that NiFe starts oxidizing aggressively beyond ∼90 ⁰C. The NiFe surfaces, aged for several months or heated for several minutes below ∼90 ⁰C, were suitable for chemical bonding with the thiol-functionalized molecules. NiFe also demonstrated excellent etching resistance in widely used dichloromethane solvent for dissolving molecular device elements. NiFe also reduced the mechanical stress induced deformities in other FM metals like cobalt. This paper also discusses the successful utilization of NiFe electrodes in the magnetic tunnel junction based molecular device fabrication approach. This research is expected to address the knowledge gap blocking the experimental development of FM based MSDs.

Keywords

magneticorganicself-assembly
Type
Articles
Information
MRS Advances , Volume 1 , Issue 7: Electronics and Photonics , 2016 , pp. 483 - 488
Copyright
Copyright © Materials Research Society 2016 

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

Tyagi, P.: Multilayer edge molecular electronics devices: a review. J. Mater. Chem. 21, 4733 (2011).CrossRefGoogle Scholar
Petta, J.R., Slater, S.K. and Ralph, D.C.: Spin-dependent transport in molecular tunnel junctions. Phys. Rev. Lett. 93, 136601 (2004).CrossRefGoogle ScholarPubMed
Pasupathy, A.N., Bialczak, R.C., Martinek, J., Grose, J.E., Donev, L.A.K., McEuen, P.L. and Ralph, D.C.: The Kondo effect in the presence of ferromagnetism. Science 306, 86 (2004).CrossRefGoogle ScholarPubMed
Zhu, M. and McMichael, R.D.: Modification of edge mode dynamics by oxidation in Ni80Fe20 thin film edges. J. Appl. Phys. 107, 5 (2010).CrossRefGoogle Scholar
Bruckner, W., Baunack, S., Hecker, M., Thomas, J., Groudeva-Zotova, S. and Schneider, C.M.: Oxidation of NiFe(20 wt.%) thin films. Mater. Sci. Eng. B-Solid State Mater. Adv. Technol. 86, 272 (2001).CrossRefGoogle Scholar
Brundle, C.R., Silverman, E. and Madix, R.J.: Oxygen Interaction with Ni-Fe Surfaces (1) LEED and XPS Studies of Ni 76-Percent-Fe 24-Percent (100). J. Vac. Sci. Tech. 16, 474 (1979).CrossRefGoogle Scholar
Greco, E., Roux, J.P. and Blakely, J.M.: Oxidation Of The (100) Surface Of A Ni-Fe Alloy. Surface Science 120, 203 (1982).CrossRefGoogle Scholar
Yoshida, K., Hamada, I., Sakata, S., Umeno, A., Tsukada, M. and Hirakawa, K.: Gate-Tunable Large Negative Tunnel Magnetoresistance in Ni–C60–Ni Single Molecule Transistors. Nano Lett. 13, 481 (2013).CrossRefGoogle ScholarPubMed
Gobbi, M., Pascual, A., Golmar, F., Llopis, R., Vavassori, P., Casanova, F. and Hueso, L.E.: C-60/NiFe combination as a promising platform for molecular spintronics Organic Electronics 13, 366 (2012).CrossRefGoogle Scholar
Salou, M., Rioual, S., Lescop, B., Calvez, B., Nguyen-Vien, G. and Rouvellou, B.: High-temperature oxidation of Permalloy in air. Corrosion Science 51, 703 (2009).CrossRefGoogle Scholar
Peng, S., Zhang, Y., Wang, M., Zhang, Y. and Zhao, W.: Magnetic Tunnel Junctions for Spintronics: Principles and Applications. Wiley Encyclopedia of Electrical and Electronics Engineering.Google Scholar
Zhu, J.-G.J. and Park, C.: Magnetic tunnel junctions. Mat. Today 9, 36 (2006).CrossRefGoogle Scholar
Lad, R.J., Schrott, A.G. and Blakely, J.M.: Oxidation of NI60FE40(100) in the presence of sulfur. J. Vac. Sci. Tech. A - Vacuum Surfaces and Films 3, 1282 (1985).CrossRefGoogle Scholar
Tyagi, P., Friebe, E. and Baker, C.: Advantages of Prefabricated Tunnel Junction Based Molecular Spintronics Devices. NANO 10, 1530002 (2015).CrossRefGoogle Scholar
Miao, G.X., Munzenberg, M. and Moodera, J.S.: Tunneling path toward spintronics. Rep. Prog. Phys. 74, 036501 (2011).CrossRefGoogle Scholar
Tyagi, P. and Hinds, B.J.: Mechanism of Ultrathin Tunnel Barrier Failure Due to Mechanical Stress Induced Nano-Sized Hillocks and Voids. J. Vac. Sci. Technol. B 28, 517 (2010).CrossRefGoogle Scholar
Tyagi, P., Li, D.F., Holmes, S.M. and Hinds, B.J.: Molecular electrodes at the exposed edge of metal/insulator/metal trilayer structures. J. Am. Chem. Soc. 129, 4929 (2007).CrossRefGoogle ScholarPubMed
Parkin, S.: Spin-polarized current in spin valves and magnetic tunnel junctions. MRS Bull. 31, 389 (2006).CrossRefGoogle Scholar
Li, D.F., Parkin, S., Wang, G.B., Yee, G.T., Clerac, R., Wernsdorfer, W. and Holmes, S.M.: An S=6 cyanide-bridged octanuclear (Fe4Ni4II)-Ni-III complex that exhibits slow relaxation of the magnetization. J. Am. Chem. Soc. 128, 4214 (2006).CrossRefGoogle Scholar
Tyagi, P., Baker, C. and D'Angelo, C.: Paramagnetic Molecule Induced Strong Antiferromagnetic Exchange Coupling on a Magnetic Tunnel Junction Based Molecular Spintronics Device. Nanotechnology 26, 305602 (2015).CrossRefGoogle ScholarPubMed
Lad, R.J. and Blakely, J.M.: Initial Oxidation And Sulfidation Of A Ni60fe40(100) Alloy Surface. Surf. Sci. 179, 467 (1987).CrossRefGoogle Scholar
Wu, H. and Wang, L.-S.: A study of nickel monoxide (NiO), nickel dioxide (ONiO), and Ni (O2) complex by anion photoelectron spectroscopy. J. Chem. Phys. 107, 16 (1997).CrossRefGoogle Scholar