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Effect of Compound Dielectric and Metal Thinning on Metal-Insulator-Metal Resonant Absorbers for Multispectral Infrared Air-Bridge Bolometers

Published online by Cambridge University Press:  16 January 2017

Robert E. Peale*
Affiliation:
Department of Physics, University of Central Florida, Orlando FL 32816
Seth Calhoun
Affiliation:
Department of Physics, University of Central Florida, Orlando FL 32816
Chris J. Fredricksen
Affiliation:
Department of Physics, University of Central Florida, Orlando FL 32816
Evan Smith
Affiliation:
Air Force Research Laboratory, Sensors Directorate, Wright Patterson AFB, OH 45433 KBRWyle Laboratories, Inc, Dayton, OH 45431
Shiva Vangala
Affiliation:
Air Force Research Laboratory, Sensors Directorate, Wright Patterson AFB, OH 45433 Azimuth Corporation, Dayton, OH 45431
Kevin Leedy
Affiliation:
Air Force Research Laboratory, Sensors Directorate, Wright Patterson AFB, OH 45433
Joshua R. Hendrickson
Affiliation:
Air Force Research Laboratory, Sensors Directorate, Wright Patterson AFB, OH 45433
Justin W. Cleary
Affiliation:
Air Force Research Laboratory, Sensors Directorate, Wright Patterson AFB, OH 45433
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Abstract

Addition of wavelength selective absorbers on microbolometers tends to increase their thermal mass and slow their infrared response times. Making the bolometric material an integral part of the absorber and minimizing layer thicknesses is one possible way to maintain high detector speeds. Here, we study experimentally the effect on permittivity of adding a layer of semiconducting VOx between two layers of SiO2. Additionally, we investigate theoretically the effect on resonance wavelength of thinning the metal in metal-insulator-metal plasmonic resonant absorbers.

Type
Articles
Copyright
Copyright © Materials Research Society 2017 

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References

REFERENCES

Liu, Na, Mesch, Martin, Weiss, Thomas, Hentschel, Mario and Giessen, Harald, “Infrared perfect absorber and its application as plasmonic sensor,” Nano Letters 10, 2342(2010).Google Scholar
Zhang, Boyang, Hendrickson, Joshua, and Guo, Junpeng, “Multispectral near-perfect metamaterial absorbers using spatially multiplexed plasmon resonance metal square structures,” J. Optical Soc. Am. B 30, 656 (2013).Google Scholar
Zhang, Bingxin, Zhao, Yanhui, Hao, Qingzhen, Kiraly, Brian, Khoo, Iam-Choon, Chen, Shufen, and Huang, Tony Jun, “Polarization-independent dual-band infrared perfect absorber based on a metal-dielectric-metal elliptical nanodisk array,” Optics Express 19, 15221 (2011).Google Scholar
Jun Lee, Sang, Ku, Zahyun, Barve, Ajit, Montoya, John, Jang, Woo-Yong, Brueck, S.R.J., Sundaram, Mani, Reisinger, Axel, Krishna, Sanjay & Noh, Sam Kyu, “A monolithically integrated plasmonic infrared quantum dot camera,” Nature Commun. 2, 286 (2011).Google Scholar
Cui, Yanxia, He, Yingran, Jin, Yi, Ding, Fei, Yang, Lui, Ye, Yuqian, Zhong, Shoumin, Lin, Yinyue, He, Sailing, “Plasmonic and metamaterial structures as electromagnetic absorbers,” Laser & Photonics Reviews 8, 495 (2014).Google Scholar
Smith, Evan M., Nath, Janardan, Ginn, James, Peale, Robert E., Shelton, David, “Responsivity improvements for a vanadium oxide microbolometer using subwavelength resonant absorbers,” Proc. SPIE 9819 – 50 (2016).Google Scholar
Smith, Evan M., Vanadium oxide microbolometers with patterned gold black or plasmonic resonant absorbers, PhD dissertation (University of Central Florida 2015).Google Scholar
Nath, Janardan, Modak, Sushrut, Rezadad, Imen, Panjwani, Deep, Rezaie, Farnood, Cleary, Justin W., and Peale, Robert E., “Far-infrared absorber based on standing-wave resonances in metal-dielectric-metal cavity,” Optics Express 23, 20366 (2015).CrossRefGoogle Scholar
Nath, Janardan, Panjwani, Deep, Khalilzadeh-Rezaie, Farnood, Yesiltas, Mehmet, Smith, Evan M., Ginn, James C., Shelton, David J., Hirschmugl, Carol, Cleary, Justin W., Peale, Robert E., “Infra-red spectral microscopy of standing-wave resonances in single metal-dielectric-metal thin-film cavity,” Proc. SPIE 9544, 95442M (2015).Google Scholar
Nath, Janardan, Maukonen, Douglas, Smith, Evan, Figueiredo, Pedro, Zummo, Guy, Panjwani, Deep, Peale, Robert E., Boreman, Glenn, Cleary, Justin W., Eyink, Kurt, “Thin-film, wide-angle, design-tunable, selective absorber from near UV to far infrared,” Proc. SPIE 8704-127 (2013).CrossRefGoogle Scholar
Wolf, Stanley and Tauber, Richard N., Silicon processing for the VLSI Era, Volume 1: Process Technology (Lattice, Sunset Beach CA, 1986) p 183.Google Scholar
Nath, Janardan, Smith, Evan, Maukonen, Douglas, and Peale, Robert E., “Optical Salisbury screen with design-tunable resonant absorption bands,” J. Appl. Phys. 115, 193103 (2014).Google Scholar