Hostname: page-component-848d4c4894-8bljj Total loading time: 0 Render date: 2024-06-19T16:32:09.761Z Has data issue: false hasContentIssue false

Variable Magnification Electron Holography for 2-D Mapping of Semiconductor Devices

Published online by Cambridge University Press:  14 March 2018

Y.Y. Wang
Affiliation:
IBM Microelectronic Division
M. Gribelyuk
Affiliation:
IBM Microelectronic Division
A. Domenicucci
Affiliation:
IBM Microelectronic Division
J. Bruley
Affiliation:
IBM Microelectronic Division
J. Gaudiello
Affiliation:
IBM Microelectronic Division
M. Kawasaki
Affiliation:
IBM Microelectronic Division JEOL USA

Extract

Core share and HTML view are not available for this content. However, as you have access to this content, a full PDF is available via the ‘Save PDF’ action button.

The exit electron wave from transmission electron microscopy (TEM) specimens contains both amplitude and phase information. In routine TEM imaging, only amplitude information is recorded on the recording devices (film or CCD camera) and phase information of the electron wave function normally is canceled out.

In 1947, Dennis Gabor proposed off-axis electron holography, a method of interference imaging in which the phase and amplitude components of the electron beam are obtained to correct spherical aberration of the transmission electron microscope to improve spatial resolution. In that process, the electron beam is split into the two beams: the un-scattered electron beam (i.e. the reference wave) and the image beam (or object wave) diffracted by the specimen and exiting the bottom of the specimen surface.

Type
Research Article
Copyright
Copyright © Microscopy Society of America 2004

References

1. Dunin-Borkoski, R.E., unpublished resultsGoogle Scholar
2. Schofield, M.A., Zhu, Y., Wu, L., Volkov, V.V., and Malac, M., JEOL news-electron optics instrumentation, Vol. 36E (1), (July 10, 2001) P.2 Google Scholar
3. Rau, W.D., Schwander, P., Baumann, R.H., Hoppner, F.H. W., Ourmazd, A., Physical Review Letter, 82, (1999), 2614.CrossRefGoogle Scholar
4. Gribelyuk, M.A., McCartney, M. R., Li, J., Murthy, C.S., Ronsheim, P., Boris, B., McMurray, J. S., Hedge, S., and Smith, D.J., Physical Review Letters, 89, (2002)CrossRefGoogle Scholar
5. Wang, Y.Y., Kawaski, M., Bruley, J., Gribelyuk, M., Domenicucci, A., Gaudiello, J., to be published in Ultramicroscopy; Wang, Y.Y., Kawaski, M., Bruley, J., Domenicucci, A., Gribelyuk, M., and Gaudiello, J., IBM and JEOL USA patent application, submitted to US patent office; Wang, Y.Y., Kawaski, M., Bruley, J., Gribelyuk, M., Domenicucci, A., Gaudiello, J., JEOL news, 39, (2004), 6.Google Scholar
6. Mccartney, M.R., Ultramicroscopy, 53, (1994), 283.Google Scholar
7. Lichte, H., Ultramicroscopy 64 (1996), 7986.Google Scholar
8. Rau, W.D. and Lichte, H., Introduction to Electron Holography, Edited by Volk, E., Allard, L. F., and Joy, D.C., 1999 Kluwer Academic/Plenum Publishers, New York, p.208 Google Scholar
9. Lichte, H., Advances in Optical and Electron Microscopy, Vol.12, p. 25, Academic Press, 1991.Google Scholar