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Transmission electron microscopy analysis of the interfaces of TiAlN/Mo multilayers

Published online by Cambridge University Press:  03 October 2008

C.J. Tavares*
Affiliation:
Depto. de Física (GRF), Universidade do Minho, Azurém, 4800-058 Guimarães, Portugal
L. Rebouta
Affiliation:
Depto. de Física (GRF), Universidade do Minho, Azurém, 4800-058 Guimarães, Portugal
J.P. Rivière
Affiliation:
Lab. de Métallurgie Physique, Université de Poitiers, 86960 Futuroscope, France
M.F. Denanot
Affiliation:
Lab. de Métallurgie Physique, Université de Poitiers, 86960 Futuroscope, France
*
Corresponding author. E-mail: ctavares@fisica.uminho.pt

Abstract

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This paper focus on the analysis of the interfaces of nanocomposite TiAlN/Mo multilayers by high-resolution transmission electron microscopy (HRTEM). These thin films were deposited by reactive magnetron sputtering, with modulation periods below 7 nm. The structural disorder at the interfaces was probed by the analysis of the X-ray diffraction data, and afterwards correlated with the TEM observations on the cross-sections of the TiAlN/Mo multilayers. For specific deposition conditions, these structures can be prepared with relatively planar interfaces, revealing layer-by-layer growth. For modulation periods below 3 nm the intermixing acts a major role in the degradation of the multilayer chemical modulation.

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Abstract
Copyright
Copyright © Microscopy Society of America 2008