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TEM Studies of Cu2O-Si and Cu2O-InP Interfaces Made by Epitaxial Electrodeposition

Published online by Cambridge University Press:  01 August 2004

Fumiyasu Oba ,
Run Liu ,
Yeonseop Yu ,
E W Bohannan ,
Frank Ernst  and
Jay Switzer
Fumiyasu Oba
Affiliation:
Case Western Reserve University, Cleveland, Ohio
Run Liu
Affiliation:
University of Missouri-Rolla
Yeonseop Yu
Affiliation:
Case Western Reserve University, Cleveland, Ohio
E W Bohannan
Affiliation:
University of Missouri-Rolla
Frank Ernst
Affiliation:
Case Western Reserve University, Cleveland, Ohio
Jay Switzer
Affiliation:
University of Missouri-Rolla
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Extract

Extended abstract of a paper presented at Microscopy and Microanalysis 2004 in Savannah, Georgia, USA, August 1–5, 2004.

Type
Research Article
Information
Microscopy and Microanalysis , Volume 10 , Issue S02 , August 2004 , pp. 292 - 293
Copyright
© 2004 Microscopy Society of America

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