Hostname: page-component-848d4c4894-nmvwc Total loading time: 0 Render date: 2024-06-16T14:34:04.586Z Has data issue: false hasContentIssue false
  • English
  • Français

A Study of Beam Sensitive Materials Using High Resolution, ULV Scanning Electron Microscopy

Published online by Cambridge University Press:  01 August 2005

M Nakagawa ,
S Takeuchi ,
A Muto ,
T Ogashiwa ,
S White  and
M Sato
M Nakagawa
Affiliation:
Hitachi Science Systems,Ltd., Japan
S Takeuchi
Affiliation:
Hitachi Science Systems,Ltd., Japan
A Muto
Affiliation:
Hitachi Science Systems,Ltd., Japan
T Ogashiwa
Affiliation:
Hitachi Science Systems,Ltd., Japan
S White
Affiliation:
Hitachi High Technologies America,Inc., Gaithersburg, Maryland
M Sato
Affiliation:
Hitachi High-Technologies Corp., Japan

Extract

Core share and HTML view are not available for this content. However, as you have access to this content, a full PDF is available via the ‘Save PDF’ action button.

Extended abstract of a paper presented at Microscopy and Microanalysis 2005 in Honolulu, Hawaii, USA, July 31--August 4, 2005

Type
Research Article
Information
Microscopy and Microanalysis , Volume 11 , Issue S02 , August 2005 , pp. 748 - 749
Copyright
© 2005 Microscopy Society of America