Hostname: page-component-848d4c4894-jbqgn Total loading time: 0 Render date: 2024-06-23T17:50:03.887Z Has data issue: false hasContentIssue false
  • English
  • Français

Silicide Identification in Rta-Processed Ti Salicide by Analytical Electron Microscopy

Published online by Cambridge University Press:  02 July 2020

A. Quintero ,
M. Libera ,
C. Cabrai Jr. ,
C. Lavoie  and
J.M.E. Harper
A. Quintero
Affiliation:
Stevens Institute of Technology, Hoboken, New Jersey
M. Libera
Affiliation:
Stevens Institute of Technology, Hoboken, New Jersey
C. Cabrai Jr.
Affiliation:
IBM Research Division, Yorktown Heights, New York
C. Lavoie
Affiliation:
IBM Research Division, Yorktown Heights, New York
J.M.E. Harper
Affiliation:
IBM Research Division, Yorktown Heights, New York
Get access

Extract

Titanium suicides have low resistivity, low contact resistance, and are widely used as interconnects in electronic devices. The most desirable structure is the C54 variant of titanium disilicide (TiSi2). It is typically formed during thermal annealing by a polymorphic transformation from the C49 TiSi2 structure. The C49 to C54 transformation has been studied extensively and there has been substantial effort to devise ways in which to lower the temperature associated with this transformation. This research uses high-resolution imaging (HREM), convergent-beam diffraction (CBED), and energy-dispersive X-ray microanalysis (EDS) to study the development of suicide morphology in response to rapid thermal annealing (RTA). Two sets of specimens have been studied: (i) 32nm Ti thin films on undoped single-crystal Si substrates [Ti/Si] and (ii) 32nm Ti films separated from an undoped single-crystal Si substrate by a 0.12nm thick Mo interlayer [Ti/Mo/Si]. This paper shows structures formed after RTA at a ramp rate 3 °C/sec to 750 °C with a hold of 1 sec

Type
Recent Developments In Microscopy For Studying Electronic and Magnetic Materials
Information
Microscopy and Microanalysis , Volume 3 , Issue S2: Proceedings: Microscopy & Microanalysis '97, Microscopy Society of America 55th Annual Meeting, Microbeam Analysis Society 31st Annual Meeting, Histochemical Society 48th Annual Meeting, Cleveland, Ohio, August 10-14, 1997 , August 1997 , pp. 453 - 454
Copyright
Copyright © Microscopy Society of America 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

Beyers, R. and Sinclair, R., J. App. Phys. 57, 5240 (1985)10.1063/1.335263CrossRefGoogle Scholar
Ma, Z and Allen, LPhys. Rev B 49 13501 (1994)10.1103/PhysRevB.49.13501CrossRefGoogle Scholar
Cabrai, C. Jr., Clevenger, L.A., Harper, J.M.E., Roy, R. A., Saenger, K. L., Miles, G. L. and Mann, R. W., J. Mater. Res. 12(2), 1997, (in press).Google Scholar
Moroux, A., -L. Zang, S., Kaplan, W., Nygren, S., Ostling, M. and Petersson, C. S., Appl. Phys. Lett. 69(7), 12 August 1996.Google Scholar
Quintero, A, Libera, C. Cabrai, M. Jr., Clevenger, L. and Harper, J.M.E., Mat. Res. Soc. Proc, Symp. Cb, Vol. 441, Dec. 1996, (in press)Google Scholar