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Si+ Implantation into SiO2 Layers and Ion Beam Mixing in SiO2/Si Interfaces

Published online by Cambridge University Press:  01 August 2010

H-J Fittinga  and
DA Zatsepin
H-J Fittinga
Affiliation:
University of Rostock, Germany
DA Zatsepin
Affiliation:
Institute of Metal Physics-Russian Academy of Science, Russia

Extract

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Extended abstract of a paper presented at Microscopy and Microanalysis 2010 in Portland, Oregon, USA, August 1 – August 5, 2010.

Type
Abstract
Information
Microscopy and Microanalysis , Volume 16 , Supplement S2 , July 2010 , pp. 1532 - 1533
Copyright
Copyright © Microscopy Society of America 2010