Hostname: page-component-77c89778f8-fv566 Total loading time: 0 Render date: 2024-07-17T00:13:14.013Z Has data issue: false hasContentIssue false

SEM Imaging of Resist Patterns Fabricated Through Imprint Lithography Techniques

Published online by Cambridge University Press:  01 August 2010

C Schamp
Affiliation:
Cerium Labs
BT Valdez
Affiliation:
Cerium Labs
LK Ballast
Affiliation:
Cerium Labs
A Gill
Affiliation:
Cerium Labs
SA Pierce
Affiliation:
Cerium Labs
L Brown
Affiliation:
Molecular Imprints
C Brooks
Affiliation:
Molecular Imprints
E Thompson
Affiliation:
Molecular Imprints
B Roth
Affiliation:
Hitachi High Technologies of America

Extract

Core share and HTML view are not available for this content. However, as you have access to this content, a full PDF is available via the ‘Save PDF’ action button.

Extended abstract of a paper presented at Microscopy and Microanalysis 2010 in Portland, Oregon, USA, August 1 – August 5, 2010.

Type
Abstract
Copyright
Copyright © Microscopy Society of America 2010