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Reduce the electron damage in atomic resolved SEM observation using aberration corrected electron microscope.

Published online by Cambridge University Press:  23 November 2012

M. Konno ,
T. Sato ,
H. Inada ,
K. Nakamura  and
Y. Zhu
M. Konno
Affiliation:
Global Application Center, Hitachi High-Technologies Corporation, Hitachinaka, Ibaraki, Japan
T. Sato
Affiliation:
Global Application Center, Hitachi High-Technologies Corporation, Hitachinaka, Ibaraki, Japan
H. Inada
Affiliation:
Advanced Microscope System Design 2nd Department, Hitachi High-Technologies Corporation, Hitachinaka, Ibaraki, Japan
K. Nakamura
Affiliation:
Advanced Microscope System Design 2nd Department, Hitachi High-Technologies Corporation, Hitachinaka, Ibaraki, Japan
Y. Zhu
Affiliation:
Brookhaven National Laboratory, Upton, NY
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Abstract

Extended abstract of a paper presented at Microscopy and Microanalysis 2012 in Phoenix, Arizona, USA, July 29 – August 2, 2012.

Type
Research Article
Information
Microscopy and Microanalysis , Volume 18 , Issue S2: Proceedings of Microscopy & Microanalysis 2012 , July 2012 , pp. 374 - 375
Copyright
Copyright © Microscopy Society of America 2012

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