Hostname: page-component-8448b6f56d-wq2xx Total loading time: 0 Render date: 2024-04-25T04:48:52.697Z Has data issue: false hasContentIssue false
  • English
  • Français

Pattern Center Determination in Electron Backscatter Diffraction Microscopy

Published online by Cambridge University Press:  12 May 2011

Jay Basinger ,
David Fullwood ,
Josh Kacher  and
Brent Adams
Jay Basinger*
Affiliation:
1007 E 150 N, Provo, UT 84606, USA Department of Mechanical Engineering, Brigham Young University, 435 Crabtree Building, Provo, UT 84602, USA
David Fullwood
Affiliation:
Department of Mechanical Engineering, Brigham Young University, 435 Crabtree Building, Provo, UT 84602, USA
Josh Kacher
Affiliation:
Materials Science and Engineering, University of Illinois at Urbana-Champaign, 2520B Leeper Drive, Champaign, IL 65822, USA
Brent Adams
Affiliation:
Department of Mechanical Engineering, Brigham Young University, 435 Crabtree Building, Provo, UT 84602, USA
*
Corresponding author. E-mail: jay.basinger@gmail.com
Get access

Abstract

The pattern center of an electron backscatter diffraction (EBSD) image indicates the relative position of the image with reference to the interaction volume of the sample. As interest grows in high-resolution EBSD techniques, accurate knowledge of this position is essential for precise interpretation of the EBSD features. In a typical EBSD framework, Kikuchi bands are recorded on a phosphor screen. If the flat phosphor were instead shaped as a sphere, with its center at the specimen's electron interaction volume, then the incident backscattered electrons would form Kikuchi bands on that sphere with parallel band edges centered on great circles. In this article, the authors present a method of pattern center (PC) refinement that maps bands from the planar phosphor onto a virtual spherical screen and measures the deviation of bands from a great circle and from possessing parallel edges. Potential sources of noise and error, as well as methods for reducing these, are discussed. Finally, results are presented on the application of the PC algorithm to two types of simulated EBSD patterns and two experimental setups, and the resolution of the method is discussed.

Keywords

pattern centerEBSDspherical projectionconvolution
Type
Electron Backscatter Diffraction Special Section
Information
Microscopy and Microanalysis , Volume 17 , Issue 3 , June 2011 , pp. 330 - 340
Copyright
Copyright © Microscopy Society of America 2011

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

Adams, B.L., Wright, S.I. & Kunze, K. (1993). Orientation imaging: The emergence of a new microscopy. Metall Trans A 24A(4), 819–831.CrossRefGoogle Scholar
Britton, T.B., Maurice, C., Fortunier, R., Driver, J.H., Day, A.P., Meaden, G., Dingley, D.J., Mingard, K. & Wilkinson, A.J. (2010). Factors affecting the accuracy of high resolution electron backscatter diffraction when using simulated patterns. Ultramicroscopy 110(12), 1443–1453.CrossRefGoogle ScholarPubMed
Burns, J.B., Hanson, A.R. & Riseman, E.M. (1986). Extracting straight lines. IEEE Trans Pattern Anal Machine Intell PAMI-8(4), 425–455.CrossRefGoogle Scholar
Carpenter, D.A., Pugh, J.L., Richardson, G.D. & Mooney, L.R. (2007). Determination of pattern centre in EBSD using the moving-screen technique. J Microsc 227(September), 246–247.CrossRefGoogle ScholarPubMed
Day, A.P. (2008). Spherical EBSD. J Microsc 230(3), 472–486.CrossRefGoogle ScholarPubMed
Day, A.P. (2009). Spherical Kikuchi maps and other rareities. In Electron Backscatter Diffraction in Materials Science, Schwartz, A.J., Kumar, M., Adams, B.L. & Field, D.P. (Eds.), pp. 65–80. New York: Kluwer Academic/Plenum Publishers.CrossRefGoogle Scholar
EDAX (2010). OIM 6.0. Draper, UT: EDAX-TSL.Google Scholar
Engler, O. & Randle, V. (2010). Introduction to Texture Analysis: Macrotexture, Microtexture, and Orientation Mapping. Boca Raton, FL: CRC Press/Taylor and Francis Group.Google Scholar
Kacher, J., Basinger, J., Adams, B.L. & Fullwood, D.T. (2010). Reply to comment by Maurice et al. in response to “Bragg's Law Diffraction Simulations for Electron Backscatter Diffraction Analysis.” Ultramicroscopy 110(7), 760–762.CrossRefGoogle Scholar
Kacher, J., Landon, C., Adams, B. & Fullwood, D. (2009). Bragg's Law diffraction simulations for electron backscatter diffraction analysis. Ultramicroscopy 109(9), 1148–1156.CrossRefGoogle ScholarPubMed
Keiner, J. (2005). Fast Spherical Fourier Transforms and Applications. Lübeck, Germany: Institut für Mathematik, Universität zu Lübeck.Google Scholar
Krieger Lassen, N.C. (1999). Source point calibration from an arbitrary electron backscattering pattern. J Microsc 195, 204–211.CrossRefGoogle Scholar
Krieger Lassen, N.C., Conradsen, K. & Juul Jensen, D. (1992). Image-processing procedures for analysis of electron back scattering patterns. Scanning Microsc 6(1), 115–121.Google Scholar
Mathworks (2008). Matlab. Natwick, MA: The Mathworks, Inc.Google Scholar
Maurice, C., Dzieciol, K. & Fortunier, R. (2011). A method for accurate localisation of EBSD pattern centres. Ultramicroscopy 111(2), 140–148.CrossRefGoogle ScholarPubMed
Maurice, C., Fortunier, R., Driver, J., Day, A., Mingard, K. & Meaden, G. (2010). Comments on the paper “Bragg's law diffraction simulations for electron backscatter diffraction analysis” by Josh Kacher, Colin Landon, Brent L. Adams & David Fullwood. Ultramicroscopy 110(7), 758–759.CrossRefGoogle Scholar
Venables, J.A. & Bin Jaya, R. (1977). Accurate microcrystallography using electron back-scattering patterns. Phil Mag 35(5), 1317–1332.CrossRefGoogle Scholar
Villert, S., Maurice, C., Wyon, C. & Fortunier, R. (2009). Accuracy assessment of elastic strain measurement by EBSD. J Microsc 233(2), 290–301.CrossRefGoogle ScholarPubMed
Wilkinson, A.J. (2006). High resolution measurements of strain and tilt distributions in SiGe mesas using electron backscatter diffraction. Appl Phys Lett 89, 242109.CrossRefGoogle Scholar
Wilkinson, A.J., Meaden, G. & Dingley, D.J. (2006). High-resolution elastic strain measurement from electron backscatter diffraction patterns: New levels of sensitivity. Ultramicroscopy 106, 307–313.CrossRefGoogle ScholarPubMed
Winkelmann, A., Trager-Cowan, C., Sweeney, F., Day, A.P. & Parbrook, P. (2007). Many-beam dynamical simulation of electron backscatter diffraction patterns. Ultramicroscopy 107, 414–421.CrossRefGoogle ScholarPubMed
Wright, S.I. (1993). Review of automated orientation imaging microscopy (OIM). J Computer-Assisted Microsc 5(3), 207–221.Google Scholar