Hostname: page-component-848d4c4894-8kt4b Total loading time: 0 Render date: 2024-06-22T20:08:41.967Z Has data issue: false hasContentIssue false
  • English
  • Français

A Path to EUV Photoresist Reference Metrology Using Restricted Tilt Electron Tomography

Published online by Cambridge University Press:  30 July 2020

Andrew Barnum ,
Mark Biedrzycki  and
Alain Moussa
Andrew Barnum
Affiliation:
Thermo Fisher Scientific, Hillsboro, Oregon, United States
Mark Biedrzycki
Affiliation:
Thermo Fisher Scientific, Hillsboro, Oregon, United States
Alain Moussa
Affiliation:
imec, Leuven, Vlaams-Brabant, Belgium

Abstract

An abstract is not available for this content so a preview has been provided. As you have access to this content, a full PDF is available via the ‘Save PDF’ action button.
Image of the first page of this content. For PDF version, please use the ‘Save PDF’ preceeding this image.'
Type
Vendor Symposium - Materials Preparation
Information
Microscopy and Microanalysis , Volume 26 , Supplement S2 , August 2020 , pp. 1990 - 1991
Check for updates
Copyright
Copyright © Microscopy Society of America 2020

References

Kawada, H., Ebizuka, Y., Sutani, T., and Kawasaki, T., “LER and LWR measurements used for monitoring wiggling and stochastic-failure (Conference Presentation),” in Metrology, Inspection, and Process Control for Microlithography XXXIII, Ukraintsev, V. A. and Adan, O., eds., 10959, International Society for Optics and Photonics, SPIE (2019).Google Scholar
Takamasu, K., Takahashi, S., Kawada, H., and Ikota, M., “Line-width roughness of advanced semiconductor features by using FIB and planar-TEM as reference metrology,” in Metrology, Inspection, and Process Control for Microlithography XXXII, Ukraintsev, V. A., ed., 10585, 48–55, International Society for Optics and Photonics, SPIE (2018).Google Scholar
Takamasu, K., Takahashi, S., Kawada, H., Ikota, M., Decoster, S., Lazzarino, F., and Lorusso, G., “Linewidth and roughness measurement of SAOP by using FIB and Planer-TEM as reference metrology,” in Metrology, Inspection,and Process Control for Microlithography XXXIII, Ukraintsev, V. A. and Adan, O., eds.,10959, 113–120, International Society for Optics and Photonics, SPIE (2019).Google Scholar