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Passive Voltage Contrast Applications with Helium Ion Microscopy Imaging

Published online by Cambridge University Press:  05 August 2019

Deying Xia ,
Shawn McVey ,
Chuong Huynh ,
Wilhelm Kuehn  and
Doug Runt
Deying Xia*
Affiliation:
Carl Zeiss SMT Inc., PCS Integration Center, One Corporation Way, Peabody, MA, USA.
Shawn McVey
Affiliation:
Carl Zeiss SMT Inc., PCS Integration Center, One Corporation Way, Peabody, MA, USA.
Chuong Huynh
Affiliation:
Carl Zeiss SMT Inc., PCS Integration Center, One Corporation Way, Peabody, MA, USA.
Wilhelm Kuehn
Affiliation:
Carl Zeiss SMT Inc., PCS Integration Center, One Corporation Way, Peabody, MA, USA.
Doug Runt
Affiliation:
Carl Zeiss SMT Inc., PCS Integration Center, One Corporation Way, Peabody, MA, USA.
*
*Corresponding author: deying.xia@zeiss.com

Abstract

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Type
Advances in Focused Ion Beam Instrumentation and Techniques
Information
Microscopy and Microanalysis , Volume 25 , Supplement S2 , August 2019 , pp. 884 - 885
Copyright
Copyright © Microscopy Society of America 2019 

References

[1]Rosenkranz, R, J. Mater. Sci: Mater Electron, 22 (2011), p.1523.Google Scholar
[2]Tan, S & Livengood, R in “Helium Ion Microscopy”, ed. Hlawacek, G and Golzhauser, A, (Springer, Switzerland), 2016, p. 471.Google Scholar
[3]Iberi, V et al. , Sci. Rep., 5 (2015), p. 11952.Google Scholar
[4]Xia, D, McVey, S, Huynh, C and Kuehn, W, ACS Appl. Mater. Interfaces, 11 (2019), p.5509.Google Scholar