Field emission electron microscopes operating at 200kV or 300kV and incorporating aberration correctors for either the incident electron probe or for the primary aberrations of the objective lens (OL) are currently under development for several laboratories in the world. OL-corrected instruments require monochromators for the electron beam, built into the electron gun prior to the accelerating stages, in order to optimize the contrast transfer characteristics of the objective lens to push the instrumental resolution limit to well beyond 0.1nm. This will allow the point resolution limit as controlled by the correction of spherical aberration Cs to potentially extend to the instrumental limit of better than 0.1nm. Figure 1 shows the contrast transfer characteristics of a Cs-corrected 200kV TEM, both without and with a beam monochromator.

Dedicated STEM instruments such as the 300kV VG-603 and lOOkV VG-501 at Oak Ridge National Laboratory, and other VG instruments at Cornell University and IBM Co. are also being adapted (by Nion Co., Kirkland, WA) to incorporate aberration correctors for the incident probe. The aim is to improve the resolution of the VG-603 instrument in dark-field imaging mode, for example, from 0.13nm to 0.05nm. in another ORNL project, the High Temperature Materials Laboratory has contracted JEOL Ltd. to construct a STEM-TEM instrument with a probe corrector designed and built by CEOS GmbH (Heidelberg, Germany).