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A Method for Site-specific Specimen Preparation of Si Device after 65 nm-node Technology using FIB-STEM/TEM System

Published online by Cambridge University Press:  05 August 2007

T Yaguchi ,
M Konno ,
Y Suzuki ,
T Kamino ,
H Inada  and
J Azuma
T Yaguchi
Affiliation:
Hitachi High-Technologies Corporation,Japan
M Konno
Affiliation:
Hitachi High-Technologies Corporation,Japan
Y Suzuki
Affiliation:
Hitachi High-Technologies Corporation,Japan
T Kamino
Affiliation:
Hitachi High-Technologies Corporation,Japan
H Inada
Affiliation:
Hitachi High-Technologies Corporation,Japan
J Azuma
Affiliation:
Hitachi High-Technologies Corporation,Japan
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Extract

Extended abstract of a paper presented at Microscopy and Microanalysis 2007 in Ft. Lauderdale, Florida, USA, August 5 – August 9, 2007

Type
Research Article
Information
Microscopy and Microanalysis , Volume 13 , Issue S02 , August 2007 , pp. 790 - 791
Copyright
© 2007 Microscopy Society of America

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